| AVS 66th International Symposium & Exhibition | |
| Plasma Science and Technology Division | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | PS+EM-TuA1 Invited Paper BEOL Etch Challenges and Solutions for Advanced Process Nodes Angélique Raley, K. Lutker-Lee, X. Sun, Y.-T. Lu, Q. Lou, N. Joy, M. Edley, TEL Technology Center, America, LLC, K. Taniguchi, M. Honda, TEL Miyagi Limited, Japan, P.E. Biolsi, TEL Technology Center, America, LLC |
| 3:00pm | PS+EM-TuA3 Enabling Fully Aligned Via for Advanced BEOL Nodes Scaling -Etch and Film Co-optimization Xinghua Sun, A. Raley, TEL Technology Center, America, LLC, J. Lee, J.C. Arnold, IBM Research Division, Albany, NY, K. Taniguchi, TEL Miyagi Limited, M. Edley, K. Lutker-Lee, TEL Technology Center, America, LLC, D. O'Meara, Tokyo Electron America, Inc., K. Tapily, Y.-T. Lu, P.E. Biolsi, TEL Technology Center, America, LLC |
| 3:20pm | PS+EM-TuA4 Non-selective Silicon Oxide and Nitride Etch in Oxygen/Nitrogen-containing Fluorocarbon Plasmas Yu-Hao Tsai, D. Zhang, Y. Han, J. Baillargeon, Y. Shi, H. Kim, M. Wang, TEL Technology Center, America, LLC, T. Yokoyama, M. Iwata, Y. Kihara, M. Honda, W. Sakamoto, Tokyo Electron Miyagi Ltd., Japan, A. Mosden, A. Metz, P.E. Biolsi, TEL Technology Center, America, LLC |
| 4:20pm | PS+EM-TuA7 Invited Paper Challenges in High-aspect-ratio Hole Etching for 3D Flash Memory Mitsuhiro Omura, J. Hashimoto, T. Adachi, Y. Kondo, M. Ishikawa, J. Abe, I. Sakai, H. Hayashi, Kioxia Corporation, Japan |
| 5:00pm | PS+EM-TuA9 Plasma Processing of Phase Change Materials Ernest Chen, N.D. Altieri, University of California, Los Angeles, C.M. Neumann, S.W. Fong, H.-S.P. Wong, Stanford University, M. Shen, T.B. Lill, Lam Research Corporation, J.P. Chang, University of California, Los Angeles |
| 5:20pm | PS+EM-TuA10 Invited Paper Meeting the Challenges in Patterning Phase Change Material for Next Generation Memory Devices Meihua Shen, L. Thorsten, J. Hoang, S. Chiou, D. Qian, A. Routzahn, J.K. Chen, A. Dulkin, J. Sims, A. McKerrow, R. Dylewicz, Lam Research Corporation |
| 6:00pm | PS+EM-TuA12 Utilizing Photosensitive Polymers to Estimate UV Radiation Exposures in Different Plasma Chamber Configurations Luxherta Buzi, M.P. Sagianis, S.U. Engelmann, IBM T.J. Watson Research Center |