| AVS 66th International Symposium & Exhibition | |
| Atomic Scale Processing Focus Topic | Wednesday Sessions |
| Session AP+BI+PS+TF-WeM |
| Session: | Surface Reaction Analysis and Emerging Applications of Atomic Scale Processing |
| Presenter: | Rachel Thorman, Johns Hopkins University |
| Authors: | R. Thorman, Johns Hopkins University E. Bilgilisoy, FAU Erlangen-Nürnberg, Germany S. Matsuda, University of Florida L. McElwee-White, University of Florida D. Fairbrother, Johns Hopkins University |
| Correspondent: | Click to Email |
Focused electron beam induced deposition (FEBID) and focused ion beam induced deposition (FIBID) are nanofabrication techniques where beams of charged particles (electrons or ions) create metal-containing nanostructures by decomposing organometallic precursors in low pressure environments. Consequently, the interactions of electrons and ions with surface-bound organometallic precursors are fundamental processes in these deposition processes. Previously performed ultra-high vacuum (UHV) studies on low energy (below 100 eV) electron interactions with adsorbed precursors (e.g. Pt(PF3)4, MeCpPtMe3, and Co(CO)3NO) have revealed that electron-induced reactions of surface bound precursors occurs in two sequential steps: (1) an initial step characterized by precursor decomposition/deposition and partial ligand desorption followed by (2) decomposition of the residual ligands. However, a similar level of understanding does not exist for low energy ion interactions with organometallic precursors. In this presentation, I will show that a low temperature, UHV surface science approach can serve as a platform to study the reactions of both low energy electrons (500 eV) and low energy ions (<1kV Ar+ ions) with organometallic precursors. Results from in situ X-ray photoelectron spectroscopy (XPS) and mass spectroscopy (MS) clearly show that low energy electron and ion-induced reactions of several surface-adsorbed species, including (η5-Cp)Fe(CO)2Re(CO)5, Ru(CO)4I2, Fe(CO)5, and Co(CO)3NO, are markedly different. Similarly to electron-induced reactions, low-energy ion-induced reactions proceed in a two-step process with an initial decomposition step primarily characterized by ligand loss. However, ligand loss is typically must more extensive than is observed for electron-induced reactions; for example, in the case of (η5-Cp)Fe(CO)2Re(CO)5 and Fe(CO)5, all CO ligands desorb in this initial step. The second step in the ion induced reactions can be described as a regime primarily characterized by physical sputtering. These contrasting results are discussed in the context of different deposition mechanisms proposed for FEBID and FIBID.