| AVS 66th International Symposium & Exhibition | |
| 2D Materials | Friday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 10:40am | 2D-FrM8 Mechanistic Insights into a Modified ALD Process to Achieve Crystalline MoS2 Thin Films Nathaniel Richey, L. Zeng, M. Yasheng, J. Shi, I. Oh, S.F. Bent, Stanford University |
| 11:00am | 2D-FrM9 The Electronic Properties of Quasi-One-Dimensional TiS3 and ZrS3 Simeon Gilbert, University of Nebraska-Lincoln, H. Yi, Synchrotron SOLEIL, A. Lipatov, T. Komesu, University of Nebraska-Lincoln, A.J. Yost, Oklahoma State University, A. Sinitskii, University of Nebraska-Lincoln, J. Avila, Synchrotron SOLEIL, France, M.C. Asensio, Madrid Institute of Materials Science, P.A. Dowben, University of Nebraska-Lincoln |
| 11:40am | 2D-FrM11 Definition of CVD Graphene Micro Ribbons with Lithography and Oxygen Plasma Ashing Fernando Cesar Rufino, A.M. Pascon, UNICAMP, Brazil, D.R.G. Larrudé, Mackenzie Presbyterian University, Brazil, L. Espindola, F.H. Cioldin, J.A. Diniz, UNICAMP, Brazil |
| 12:00pm | 2D-FrM12 Reactivity of Metal Contacts with Monolayer Tungsten Disulfide Ama Agyapong, K.A. Cooley, S.E. Mohney, The Pennsylvania State University |