| AVS 65th International Symposium & Exhibition | |
| Thin Films Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | TF+AS+EL+PS-ThM1 Invited Paper Defects in Thin Films: A First Principles Perspective Douglas Irving, J.S. Harris, J.N. Baker, S. Washiyama, M.H. Breckenridge, North Carolina State University, P. Reddy, Adroit Materials, R. Collazo, Z. Sitar, North Carolina State University |
| 8:40am | TF+AS+EL+PS-ThM3 Advances in Numerical Simulation of SiN ALD Paul Moroz, TEL Technology Center, America, LLC |
| 9:00am | TF+AS+EL+PS-ThM4 Diffusion Kinetics Study of Adatom Islands: Activation Energy Barriers Predicted using Data-driven Approaches ShreeRam Acharya, T.S. Rahman, University of Central Florida |
| 9:20am | TF+AS+EL+PS-ThM5 Using Ellipsometry and XPS to Understand the Degradation of Thin-film Aluminum Mirrors Protected by Ultrathin Fluorides M.R. Linford, Brian I. Johnson, R.S. Turley, D.D. Allred, Brigham Young University |
| 9:40am | TF+AS+EL+PS-ThM6 Model for Amorphous Thin Film Formation and Validation Rahul Basu, VTU, India |
| 11:00am | TF+AS+EL+PS-ThM10 Invited Paper 2D TMD Monolayer of MoS2 BY ALD and Insight in the Mechanism by Surface Organometallic Chemistry Elsje Alessandra Quadrelli, CNRS CPE Lyon, France |
| 11:40am | TF+AS+EL+PS-ThM12 A Novel Fourier Transform Ion Trap Mass Spectrometer for Semiconductor Processes Gennady Fedosenko, H.-Y. Chung, R. Reuter, A. Laue, V. Derpmann, L. Gorkhover, M. Aliman, M. Antoni, Carl Zeiss SMT GmbH, Germany |
| 12:00pm | TF+AS+EL+PS-ThM13 Realization of Shifts in Threshold Voltage and Subthreshold Swing in Atomic Layer Deposited Zinc Oxide As Channel Layer through in-situ Half-Cycle Analysis Harrison Sejoon Kim, A.T. Lucero, S.J. Kim, J. Kim, University of Texas at Dallas |