AVS 65th International Symposium & Exhibition
    Thin Films Division Thursday Sessions
       Session TF+AS+EL+PS-ThM

Invited Paper TF+AS+EL+PS-ThM10
2D TMD Monolayer of MoS2 BY ALD and Insight in the Mechanism by Surface Organometallic Chemistry

Thursday, October 25, 2018, 11:00 am, Room 102A

Session: In-situ Characterization and Modeling of Thin Film Processes
Presenter: Elsje Alessandra Quadrelli, CNRS CPE Lyon, France
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Atomically-thin crystalline domains of MoS2 [1] or WS2 [2] are obtained from an organometallic amorphous deposit obtained by ALD/MLD.

This original result with respect to the state of the art has been mechanistically rationalized with in situ and in operando modelling studies on the oxide nanobeads at different annealing temperatures. This contribution will present the surface organometallic method, the characterization of the 2D layers (among which the first in-plane micrographs of ALD-grown MoS2 samples)[1] and the proposed surface coordination chemistry mechanism at hand obtained with model studied on 3D silica beads. These model studies couple in operando infra-red spectroscopy, gas-chromatography detection of the released by-products and atomic composition of the deposit at each cycle, leading to molecular level understanding of the growth process.

Acknowledgments : This work was carried out within the framework of the partnership between the C2P2 research unit (UMR 5265 CNRS CPE Lyon University Claude Bernard Lyon 1) and CEA's Directorate of Technological Research (DRT) on the nanochemistry platform installed in CPE Lyon. The authors of the papers below thank CPE Lyon, CNRS, CEA / LETI (Silicon Technology Department and nanocharacterization platform) for the support and the DRF / INAC for the collaboration in the framework of the "2D Factory" project.

Ref : [1] Cadot et al.Nanoscale , 2017, 9, 467. [2] Cadot et al. JSVT A 2017, 35, 061502 .