| AVS 65th International Symposium & Exhibition | |
| Surface Science Division | Friday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | SS+AS+HC-FrM1 Invited Paper Ambient Pressure Electron Spectroscopy (XPS, XAS) and Electron Microscopy Studies of the Structure and Chemistry of Nanostructured Model Catalysts John Hemminger, University of California Irvine |
| 9:00am | SS+AS+HC-FrM3 In-operando Investigation of the Initial Oxidation Stages for NiCr-(W) Alloys with X-ray Photoelectron Spectroscopy Cameron Volders, V. Angelici Avincola, P. Reinke, University of Virginia |
| 9:20am | SS+AS+HC-FrM4 Surface Hydroxylation of Polar (000-1) and Non-polar (11-20) ZnO Probed with AP-XPS Sana Rani, A. Broderick, J.T. Newberg, University of Delaware |
| 9:40am | SS+AS+HC-FrM5 Reason of High Stability and Reactivity of Ni/silicalite-1 Catalyst for Dry Reforming of Methane Evgeny Vovk, X. Zhou, Z. Liu, C. Guan, Y. Yang, ShanghaiTech University, China, W. Kong, Shanghai Advanced Research Institute, China, R. Si, Shanghai Synchrotron Radiation Facility, Shanghai Institute of Applied Physics, Chaina |
| 10:00am | SS+AS+HC-FrM6 Recent Development in XPS and Ambient Pressure XPS Techniques Lukasz Walczak, PREVAC sp. z o.o., Poland |
| 10:20am | SS+AS+HC-FrM7 Quantum Mechanics and Reaction Kinetics Study on SiO2 and SiN Dry Isotropic Chemical Etching Process Taiki Kato, M. Matsukuma, K. Matsuzaki, L. Chen, Tokyo Electron Technology Solutions Limited, Japan |
| 10:40am | SS+AS+HC-FrM8 Viscosity and Surface Tension Effects on Metal Sputtered onto Low Vapor Pressure Liquids Mark De Luna, M. Gupta, University of Southern California |