| AVS 65th International Symposium & Exhibition | |
| Plasma Science and Technology Division | Friday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | PS-FrM1 Investigation of Electrical Asymmetric Effect in Very High Frequency Plasma Source using Electromagnetic Plasma Model Xiaopu Li, K. Bera, S. Rauf, K.S. Collins, Applied Materials |
| 8:40am | PS-FrM2 Simulation of Pulsed Inductively Coupled Plasmas Jun-Chieh Wang, W. Tian, S. Rauf, S. Sadighi, J.A. Kenney, P.J. Stout, V. Vidyarthi, J. Guo, K. Delfin, N. Lundy, Applied Materials |
| 9:00am | PS-FrM3 Invited Paper The Important Role of Metal Vapour in Arc Welding: New Insights from Modelling Anthony Murphy, J. Xiang, H. Park, F.F. Chen, CSIRO, Australia |
| 9:40am | PS-FrM5 Molecular Dynamics Study on Collision Cascade Dynamics for Sputtering of Lennard-Jones Particles Nicolas Mauchamp, M. Isobe, S. Hamaguchi, Osaka University, Japan |
| 10:00am | PS-FrM6 Surface Reaction Analysis by Molecular Dynamics (MD) Simulation for SiO2 Atomic Layer Etching (ALE) Satoshi Hamaguchi, Y. Okada, M. Isobe, T. Ito, K. Karahashi, Osaka University, Japan |
| 10:20am | PS-FrM7 Atomistic Simulations of He Plasma Modification of SiO2 Thin Films for Advanced Etch Processes Florian Pinzan, R. Blanc, F. Leverd, STMicroelectronics, France, E. Despiau-Pujo, LTM, Univ. Grenoble Alpes, CEA-LETI, France |
| 10:40am | PS-FrM8 Plasma Characteristics in a Capacitively Coupled System at Moderately High Pressure: Model and Experiment Comparison David J. Peterson, S. Shannon, North Carolina State University, W. Tian, P. Kraus, K. Bera, S. Rauf, T. Chua, T. Koh, Applied Materials Inc. |
| 11:00am | PS-FrM9 Numerical Modeling of Capacitively Coupled Plasma Process Chamber using CCPFoam Abhishek Kumar Verma, University of California Merced, K. Bera, S. Rauf, Applied Materials, A. Venkattraman, University of California Merced |
| 11:20am | PS-FrM10 Silicon Carbide Nanoparticles for Thermoelectric Composites and Graphene Coatings for Plasmonics Devin Coleman, University California, Riverside, A. Hosseini, A. Greaney, University of California, Riverside, S. Bux, J.P. Fleurial, Jet Propulsion Laboratory, California Institute of Technology, L. Mangolini, University of California, Riverside |
| 11:40am | PS-FrM11 Electromagnetic Effects in Wide Area Very High Frequency Linear Plasma Source Kallol Bera, X. Li, S. Rauf, K.S. Collins, Applied Materials |
| 12:00pm | PS-FrM12 External Circuitry Models for PIC Simulations of Cylindrical Magnetron Sputtering Chamber Nate Crossette, T.G. Jenkins, D.N. Smithe, J.R. Cary, Tech-X Corporation |