| AVS 65th International Symposium & Exhibition | |
| Plasma Science and Technology Division | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | PS+EM+NS+SS-TuA1 Invited Paper Self-limiting Growth of III-nitride Materials via Hollow-cathode Plasma-ALD: Structural and Chemical Analysis Necmi Biyikli, A. Mohammad, D. Shukla, University of Connecticut |
| 3:00pm | PS+EM+NS+SS-TuA3 Electrostatic Charge of Solution-droplet in Plasma-coupled Micro Reactor Tae Hwan Kim, SW. Lee, National Fusion Research Institute, Republic of Korea |
| 3:20pm | PS+EM+NS+SS-TuA4 Surfactant-free and Stable Colloidal Metal Oxide Ultra-small Quantum Dots via Plasma-liquid Electrochemistry Dillibabu Padmanaban, D. Carolan, R. McGlynn, T. Velusamy, P. Maguire, D. Mariotti, Nanotechnology & Integrated Bio-Engineering Centre, Ulster University, UK |
| 4:20pm | PS+EM+NS+SS-TuA7 From Organometallic Precursors to Bimetallic Nanocatalysts using Atmospheric-pressure Plasma Processes Joffrey Baneton, J. Mertens, M. Smiljanic, S. Cauchies, T. Segato, Université Libre de Bruxelles, Belgium, Y. Busby, Université de Namur, Belgium, G. Caldarella, Université de Liège, Belgium, V. Debaille, S. Godet, Université Libre de Bruxelles, Belgium, J.-J. Pireaux, Université de Namur, Belgium, N. Job, Université de Liège, Belgium, M.J. Gordon, University of California at Santa Barbara, R.M. Sankaran, Case Western Reserve University, F. Reniers, Université Libre de Bruxelles, Belgium |
| 4:40pm | PS+EM+NS+SS-TuA8 Synthesis of Hydrogenated Amorphous Carbon Nanoparticles using High-Pressure CH4+Ar Plasmas and Their Deposition Kazunori Koga, S.H. Hwang, K. Kamataki, N. Itagaki, Kyushu University, Japan, T. Nakatani, Okayama University of Science, Japan, M. Shiratani, Kyushu University, Japan |
| 5:00pm | PS+EM+NS+SS-TuA9 Antimony-doped Tin Oxide Nanocrystals Synthesized by Low Temperature Plasma Qinyi Chen, E. Thimsen, Washington University in St. Louis |
| 5:20pm | PS+EM+NS+SS-TuA10 Femtosecond Laser Texturing of Plasma-immersed Ti to Create TiN Chisung Ahn, E. Barlaz, D.N. Ruzic, University of Illinois at Urbana-Champaign |
| 5:40pm | PS+EM+NS+SS-TuA11 Modeling Chemical Reactions in Contact Glow Discharge Electrolysis Bocong Zheng, M. Shrestha, K.L. Wang, T. Schuelke, Q.H. Fan, Michigan State University |
| 6:00pm | PS+EM+NS+SS-TuA12 Effects of Light Ion Beam Irradiation in Plasma Etching Processes Kazuhiro Karahashi, T. Ito, H. Li, M. Isobe, K. Mizotani, S. Shigeno, Osaka University, Japan, M. Fukasawa, A. Hirata, T. Tatsumi, Sony Semiconductor Solutions Corporation, Japan, S. Hamaguch, Osaka University, Japan |