| AVS 65th International Symposium & Exhibition | |
| Advanced Ion Microscopy Focus Topic | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| HI-ThP1 He+ and Ne+ Ion Beam Resolution Dependency on Beam Energy Waqas Ali, Intel Corporation, USA, S. Tan, Intel Corporation, R.M. Hallstein, R.H. Livengood, Intel Corporation, USA |
| HI-ThP2 Focused Cs Ion Beam-Induced Deposition and Gas Assisted Etch Characterization Results for 10nm Circuit Edit Applications Roy Hallstein, R.H. Livengood, M.P. Ly, Intel Corporation, USA, Y. Greenzweig, Y. Drezner, Intel Corporation, Israel, B.J. Knuffman, A.V. Steele, A.B.J. Knuffman, zeroK NanoTech |