| AVS 65th International Symposium & Exhibition | |
| 2D Materials Focus Topic | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2D-ThP1 Activated Reduction Plasma Assisted Sulfurization in Layered WS2 Synthesis Chien-Pao Lin, C.-N. Hsiao, ITRC,NARL, Taiwan, Republic of China, P.-S. Chen, C.-A. Jong, No Matching Affiliation, Taiwan, Republic of China |
| 2D-ThP2 Quantized States, Berry Phases, and Quantum-Hall Wedding-Cake structures in Graphene Quantum Dots Fereshte Ghahari Kermani, D. Walkup, C. Gutiérrez, National Institute of Standards and Technology (NIST)/ University of Maryland, College Park, C. Lewandowski, Department of Physics, Massachusetts Institute of Technology, J. Rodriguez-Nieva, Massachusetts Institute of Technology, K. Watanabe, T. Taniguchi, National Institute for Materials Science, Japan, L. Levitov, Massachusetts Institute of Technology, N.B. Zhitenev, J.A. Stroscio, National Institute of Standards and Technology (NIST) |
| 2D-ThP3 Growth Phenomena and Mechanism of MoS2 Formed by Conventional Chemical Vapor Deposition Cheol-Min Hyun, J.H. Choi, S.W. Lee, J.-H. Ahn, Korea Maritime and Ocean University, Republic of Korea |
| 2D-ThP4 Graphene Micro Wires Defined by Photolithography and Plasma Etching for Field Effect Transistors F.C. Rufino, A.M. Pascon, University of Campinas, Brazil, D.G. Larrude, Mackenzie Presbyterian University, Brazil, W.C. Mariano, José Alexandre Diniz, University of Campinas, Brazil |
| 2D-ThP6 In-Operando AFM/STM and Transport Measurements of a Graphene Hall Bar Device Johannes Schwenk, National Institute of Standards and Technology (NIST)/ University of Maryland, College Park, S. Kim, National Institute of Standards and Technology (NIST) / Department of Physics and Astronomy, Seoul National University, Seoul, Korea, F. Ghahari, National Institute of Standards and Technology (NIST)/ University of Maryland, College Park, J. Berwanger, Institut für Experimentelle und Angewandte Physik, Universität Regensburg, Germany, W.G. Cullen, S.R. Blankenship, National Institute of Standards and Technology (NIST), Y. Kuk, Department of Physics and Astronomy, Seoul National University, Seoul, Korea, F.J. Giessibl, Institut für Experimentelle und Angewandte Physik, Universität Regensburg, Germany, N.B. Zhitenev, J.A. Stroscio, National Institute of Standards and Technology (NIST) |