AVS 63rd International Symposium & Exhibition
    Thin Film Thursday Sessions

Session TF1-ThM
Control and Modeling of Thin Film Growth and Film Characterization

Thursday, November 10, 2016, 8:00 am, Room 104E
Moderators: Berc Kalanyan, National Institute of Standards and Technology (NIST), Richard Vanfleet, Brigham Young University


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am TF1-ThM1 Invited Paper
Adventures in Group IV Ordering: Super-periodicities at the Atomic/Nano/Meso/scale
Jerrold Floro, J. Amatya, C. Duska, C.W. Petz, University of Virginia, D. Yang, J. Levy, University of Pittsburgh
8:40am TF1-ThM3
Combinatorial Fabrication of Cu-Fe2O3 Composite Nanostructures by Oblique Angle Co-Deposition
S. Larson, W.J. Huang, Yiping Zhao, University of Georgia
9:00am TF1-ThM4
Structural and Electronic Properties of Titanium Doped Ga2O3 Thin Films
Sandeep Manandhar, E. Rubio, C.V. Ramana, The University of Texas at El Paso
9:20am TF1-ThM5
Characterizing Patterns and Order in Self-Assembled Langmuir Films of Quantum Dots
Zachary Whitfield, J.J. Weimer, University of Alabama in Huntsville
9:40am TF1-ThM6
Radical-Based MBE Growth, Structure, Defects and Transport in High-Mobility Epitaxial La-doped BaSnO3 Films
A. Prakash, P. Xu, J. Dewey, Bharat Jalan, University of Minnesota
11:00am TF1-ThM10
Reduction of Extended Defects in SiC Epilayers Grown on 2° Offcut Substrates
Rachael Myers-Ward, N. Mahadik, R. Stahlbush, P. Klein, K.M. Daniels, A. Boyd, K. Gaskill, Naval Research Laboratory
11:20am TF1-ThM11
Modeling the Structure and Medium Range order of ALD Amorphous Oxide Thin Films
Angel Yanguas-Gil, J.W. Elam, Argonne National Laboratory
11:40am TF1-ThM12
From Nano-porosity to Macro-scale Defects: Ellipsometric Porosimetry and Electrochemical Impedance Spectroscopy Characterization of Thin Inorganic Films
Alberto Perrotta, W.M.M. Kessels, M. Creatore, Eindhoven University of Technology, Netherlands
12:00pm TF1-ThM13
Thermal Conductivity and Mechanical Properties of AlN-based Thin Films
Vincent Moraes, H. Riedl, Technische Universität Wien, Austria, H. Bolvardi, Oerlikon Balzers, Liechtenstein, S. Kolozsvári, Plansee Composite Materials GmbH, Germany, M. Ikeda, L. Prochaska, S. Paschen, P.H. Mayrhofer, Technische Universität Wien, Austria