AVS 63rd International Symposium & Exhibition | |
Plasma Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
2:20pm | PS-WeA1 Plasma-Based Removal of Native Oxide Layers on Si and SiGe Substrates While Minimizing Surface Residues D. Metzler, Chen Li, University of Maryland, College Park, C.S. Lai, E.A. Hudson, Lam Research Corporation, G.S. Oehrlein, University of Maryland, College Park |
2:40pm | PS-WeA2 Electrical Characterization of SiN Modified by Hydrogen and Helium Plasma for New Atomic Layer Etching Processes Florentin Chambettaz, L. Vallier, O. Joubert, Univ. Grenoble Alpes, France |
3:00pm | PS-WeA3 Electron Beam Generated Plasmas Produced in Fluorine-Containing Gases David Boris, G.M. Petrov, Tz.B. Petrova, S.C. Hernandez, S.G. Walton, Naval Research Laboratory |
3:20pm | PS-WeA4 Plasma-Enhanced Germanium Atomic Layer Etching (ALE) Wenbing Yang, S. Tan, K. Kanarik, R. Arghavani, T.B. Lill, Y. Pan, Lam Research Corp. |
4:20pm | PS-WeA7 Invited Paper Damage Monitoring of GaN Film for Material Processing Daisuke Ogawa, Y. Banno, Y. Nakano, K. Nakamura, Chubu University, Japan |
5:00pm | PS-WeA9 Neutral Beam Etching of Germanium Microstructure for Ge Fin-FET Devices E.T. Lee, Shuichi Noda, Tohoku University, Japan, W. Mizubayashi, K. Endo, AIST, S. Samukawa, Tohoku University, Japan |
5:20pm | PS-WeA10 Selective Trimming of Surface Oxygenated Groups through Vacuum Ultraviolet Light Irradiation in an Evacuated Environment Ahmed Soliman, T. Utsunomiya, T. Ichii, Kyoto University, Japan, H. Sugimura, Kyoto University, Japan |
5:40pm | PS-WeA11 Transistor Performance Improvement Through Low-Damage Plasma-Enhanced ALD Metal Gates Christopher Brennan, C. Neumann, S. Vitale, MIT Lincoln Laboratory |
6:00pm | PS-WeA12 In situ Optical Diagnostics during Atomic Layer Etching of SiO2 using Alternating Cycles of C4F8 and Ar Plasma N. Leick, Ryan Gasvoda, Colorado School of Mines, A. van de Steeg, Eindhoven University of Technology, Netherlands, R.A. Ovanesyan, Colorado School of Mines, R. Bhowmick, E.A. Hudson, Lam Research Corporation, S. Agarwal, Colorado School of Mines |