| AVS 62nd International Symposium & Exhibition | |
| Plasma Science and Technology | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | PS-TuM1 Invited Paper Interconnect Patterning in the EUV Era John Arnold, IBM Research Division, Albany, NY |
| 8:40am | PS-TuM3 Challenges for the sub-32nm Pitch Self-aligned Quadruple Patterning (SAQP) at Back End of Line (BEOL) Nihar Mohanty, R. Farrell, A. Raley, E. Franke, J. Smith, S. Song, A. Ko, A. Ranjan, A. deVilliers, P. Biolsi, TEL Technology Center, America, LLC, W. Wang, G. Beique, C. Labelle, L. Sun, R. Kim, Globalfoundries, Ny, Usa |
| 9:00am | PS-TuM4 Novel Patterning Process for the 7xnm and Beyond Toru Hisamatsu, Tokyo Electron Miyagi Limited, Japan, T. Oishi, S. Ogawa, Tokyo Electron Miyagi Limited, Y. Kihara, M. Honda, Tokyo Electron Miyagi Limited, Japan |
| 9:20am | PS-TuM5 Advanced Interconnect Process Techniques with EUV Photolithographic Masks and Sub-50nm Pitch Structures Jessica Dechene, J.C. Shearer, IBM Research Division, A.P. Labonte, GLOBALFOUNDRIES, J. Lucas, H. Matsumoto, B. Messer, A. Metz, TEL Technology Center, America, LLC, C. Labelle, GLOBALFOUNDRIES, J.C. Arnold, IBM Research Division |
| 9:40am | PS-TuM6 Advanced Plasma Etch Techniques for Sub-50nm Pitch Contact & Interconnect Etches Andre Labonte, Globalfoundries, NY, USA, R. Chao, J.M. Dechene, IBM Albany Nanotech Center, B. Nagabhirava, P. Wang, P. Friddle, Lam Research, N. Rassoul, ST Microelectronics, C. Labelle, Globalfoundries, NY, USA, J.C. Arnold, IBM Albany Nanotech Center, M. Goss, Lam Research |
| 11:20am | PS-TuM11 Characterization of Patterned Porous Low-k Dielectrics after Plasma Patterning and Subsequent Wet Processing/Cleaning QuocToan Le, E. Kesters, S. Decoster, B.T. Chan, F. Holsteyns, IMEC, Belgium, S. De Gendt, IMEC, KU Leuven Belgium |
| 11:40am | PS-TuM12 Cryogenic Etching of Porous Organosilicate Low-k Materials: Reduction of Plasma Induced Damage Floriane Leroy, T. Tillocher, GREMI CNRS/Université d'Orléans, France, L. Zhang, IMEC, KU Leuven, Belgium, P. Lefaucheux, GREMI CNRS/Université d'Orléans, France, K. Yatsuda, TEL, Japan, K. Maekawa, TEL Technology Center, America, LLC, J.-F. de Marneffe, M. Baklanov, IMEC, Belgium, R. Dussart, GREMI CNRS/Université d'Orléans, France |
| 12:00pm | PS-TuM13 Remote Shielded Microwave Mini Plasma Source for Sample Cleaning Herman Bekman, R.J. Bolt, F.A. Nennie, P.M. Muilwijk, F.T. Molkenboer, N.B. Koster, O. Kievit, TNO Technical Sciences, Netherlands |