| AVS 61st International Symposium & Exhibition | |
| Nanometer-scale Science and Technology | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | NS+HI-TuM1 Invited Paper Nanoetching and Characterization Towards sub-5 nm Patterning Deirdre Olynick, D. Staaks, D. Tierno, S. Dallarto, S. Sassolini, B. Muddiman, Z. Lui, G. Calafiore, Lawrence Berkeley National Laboratory, X. Gu, T.P. Russell, University of Massachusetts, Amherst, M. Kocsis, Inpria Corporation |
| 8:40am | NS+HI-TuM3 Cut Patterning Challenges for the 14nm-Node and Beyond Ryan Jung, J.R. Sporre, F.L. Lie, S. Kanakasabapathy, S. Sieg, IBM Albany Nanotech Center, A. Ranjan, S. Voronin, A. Raley, V. Rastogi, A. Ko, TEL Technology Center, America, LLC, D. Lee, Samsung Electronics |
| 9:00am | NS+HI-TuM4 Nanopore Memristors: Sub-10nm Devices Built on Membranes Milled with a Helium Ion Microscope Douglas Ohlberg, J.P. Strachan, W. Thompson, Z.Y. Li, R.S. Williams, Hewlett Packard |
| 9:20am | NS+HI-TuM5 Characterization of Cluster-Based High-Resolution Inorganic Resists Rose Ruther, R.P. Oleksak, R. Frederick, B.T. Flynn, G.S. Herman, Oregon State University |
| 9:40am | NS+HI-TuM6 Development Characteristics of PMMA in Alternative Alcohol:Water Mixtures Leonidas Ocola, Argonne National Laboratory |
| 11:00am | NS+HI-TuM10 Room Temperature Electron Beam Assisted Oxygen Purification of Electron Beam Induced Pt Deposits: Towards Pure and High-Fidelity Nanostructures Brett Lewis, M.G. Stanford, University of Tennessee, H. Plank, Graz University of Technology, Austria, J.H. Noh, University of Tennessee, J. Fowlkes, Oak Ridge National Laboratory, P.D. Rack, University of Tennessee |
| 11:20am | NS+HI-TuM11 Prospects for Nanofabrication using the Combination of STM-based Depassivation Lithography, Selective ALD, and Material Etch Processes Joshua Ballard, Zyvex Labs, S. Anz, S. Sando, Systine, Inc., M. Bischof, University of North Texas, D. Dick, University of Texas at Dallas, J. Fu, National Institute of Standards and Technology (NIST), D. Jaeger, University of North Texas, R. Longo, University of Texas at Dallas, J. Owen, E. Fuchs, Zyvex Labs, S. McDonnell, University of Texas at Dallas, R. Reidy, University of North Texas, Y.J. Chabal, R.M. Wallace, University of Texas at Dallas, J. Randall, Zyvex Labs, A. Cherala, S. Singhal, S. Sreenivasan, University of Texas at Austin |