| AVS 60th International Symposium and Exhibition | |
| Plasma Science and Technology | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS+TF-MoA1 Practical Aspects of using Tailored Voltage Waveforms for Thin Film Processing of Photovoltaic Devices E.V. Johnson, B. Bruneau, LPICM-CNRS, Ecole Polytechnique, France, P.A. Delattre, T. Lafleur, J.-P. Booth, LPP-CNRS, Ecole Polytechnique, France |
| 2:20pm | PS+TF-MoA2 Characteristics of Plasma Generated by ICP-CVD with Various H2/SiH4 Ratios and the Resultant Properties of nc-Si:H Thin Films J.H. Hsieh, Y.L. Lie, S.C. Lin, Ming Chi University of Technology, Taiwan, Republic of China |
| 2:40pm | PS+TF-MoA3 Invited Paper Medium Range Order (MRO) in "Amorphous (a)-Si(H)" Alloys in PV and TFT Devices with Intrinsic, B and P Doped a-Si(H) and a-Si,Ge(H) Layers: Reduction of Photo- and Stress-induced Defects by O-bonding G. Lucovsky, D. Zeller, C. Cheng, Y. Zhang, North Carolina State University |
| 3:40pm | PS+TF-MoA6 Invited Paper Plasma Prize Talk - Plasma Processing Advances at Illinois D.N. Ruzic, University of Illinois at Urbana Champaign |
| 4:20pm | PS+TF-MoA8 PECVD, Rf vs Dual Frequency : Investigation of Plasma Influence on Metalorganic Precursors Decomposition and Material Characteristics F. Piallat, STMicroelectronics, France, C. Vallee, Ltm - Minatec - Cea/leti, France, R. Gassilloud, P. Michallon, CEA-LETI, France, B. Pelissier, Ltm - Minatec - Cea/leti, France, P. Caubet, STMicroelectronics, France |
| 4:40pm | PS+TF-MoA9 Reactive High Power Impulse Magnetron Sputtering (HiPIMS) J.T. Gudmundsson, University of Iceland, F. Magnus, Uppsala University, Sweden, T.K. Tryggvason, S. Shayestehaminzadeh, S. Olafsson, University of Iceland |
| 5:00pm | PS+TF-MoA10 Sputtering Yields and Selectivity of Magnetic Materials by Chemically Reactive Plasmas H. Li, Y. Muraki, K. Karahashi, S. Hamaguchi, Osaka University, Japan |
| 5:20pm | PS+TF-MoA11 Two-dimensional Growth of Novel ZnO based Semiconductor ZnInON with Tunable Bandgap by Magnetron Sputtering K. Matsushima, R. Shimizu, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Kyushu University, Japan |