| AVS 59th Annual International Symposium and Exhibition | |
| Plasma Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | PS+TC-WeM1 Formation Dynamics and Characterization of Organosilicon Powders in Microwave-Sustained Plasmas at Atmospheric-Pressure V. Roy-Garofano, A. Kilicaslan, O. Levasseur, L. Stafford, M. Moisan, Universite de Montreal, Canada, C. Côté, A. Sarkissian, Plasmionique, Canada |
| 8:20am | PS+TC-WeM2 Infrared Gas Phase Studies in High-Current Dielectric Barrier Discharges Applied in Roll-to-Roll Deposition of Silica-Like Layers at Atmospheric Pressure S. Welzel, Eindhoven University of Technology, Netherlands, S.A. Starostin, H. de Vries, FUJIFILM Manufacturing Europe B.V., Netherlands, M.C.M. van de Sanden, R. Engeln, Eindhoven University of Technology, Netherlands |
| 8:40am | PS+TC-WeM3 Invited Paper Atmospheric Pressure Plasma Processes for Preparation of Si-Based Thin Films K. Yasutake, H. Ohmi, T. Yamada, H. Kakiuchi, Osaka University, Japan |
| 9:20am | PS+TC-WeM5 Deposition of Organic-Inorganic Nanocomposite Coatings by Aerosol-Assisted Atmospheric Pressure DBDs F. Fanelli, Institute of Inorganic Methodologies and Plasmas (IMIP) - CNR, Bari, Italy, A.M. Mastrangelo, F. Fracassi, University of Bari Aldo Moro - IMIP CNR, Bari, Italy |
| 10:40am | PS+TC-WeM9 Invited Paper Modified Dielectric Barrier Discharges for Display Materials Processing G.Y. Kim, Sungkyunkwan University, Korea, J.B. Park, SKKU Advanced Institute of Nano Technology (SAINT), Korea, G.Y. Yeom, Sungkyunkwan University & SKKU Advanced Institute of Nano Technology (SAINT), Korea |
| 11:20am | PS+TC-WeM11 Etching of PTFE by Atmospheric Plasmas: Effect of the Gas Composition on the Reactions Processes and Hydrophobicity J. Hubert, T. Dufour, N. Vandencasteele, Université Libre de Bruxelles, Belgium, S. Desbief, R. Lazzaroni, Materia Nova Research Center, Belgium, F. Reniers, Université Libre de Bruxelles, Belgium |
| 11:40am | PS+TC-WeM12 Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition of Hydrophobic Thin Film Coatings Using Liquid Precursors J. Yim, V. Rodriguez-Santiago, A. Williams, J. Hirvonen, D. Pappas, U.S. Army Research Laboratory |