AVS 59th Annual International Symposium and Exhibition
    Plasma Science and Technology Wednesday Sessions
       Session PS+TC-WeM

Invited Paper PS+TC-WeM9
Modified Dielectric Barrier Discharges for Display Materials Processing

Wednesday, October 31, 2012, 10:40 am, Room 24

Session: Atmospheric Plasma Processing for PV, Flexible Electronics (incl. R2R)
Presenter: G.Y. Yeom, Sungkyunkwan University & SKKU Advanced Institute of Nano Technology (SAINT), Korea
Authors: G.Y. Kim, Sungkyunkwan University, Korea
J.B. Park, SKKU Advanced Institute of Nano Technology (SAINT), Korea
G.Y. Yeom, Sungkyunkwan University & SKKU Advanced Institute of Nano Technology (SAINT), Korea
Correspondent: Click to Email
Atmospheric pressure plasmas have been investigated tens of years for the application to semiconductor and display processing. Especially, due to the uniform discharge characteristics, dielectric barrier discharges (DBDs) composed of electrodes covered with dielectric material have been investigated intensively for those applications. In our study, the conventional DBDs have been modified to enhance the plasma density and also, the different types of DBDs such as remote-type DBD and hybrid-type DBDs (which is composed of direct-type DBD and remote-type DBD) have been used for the surface treatment, growth, deposition, and etching of material applied to flat panel displays and their effects on the material processing have been studied. In this presentation, I will present the plasma characteristics and materials characteristics obtained with those different types of modified DBDs and will suggest possible applications of the DBD-type atmospheric pressure plasmas for the next generation display processing such as in-line/roll-to-roll processing, flexible display substrate processing, inkjet processing, etc.