AVS 59th Annual International Symposium and Exhibition
    Plasma Science and Technology Wednesday Sessions
       Session PS+TC-WeM

Paper PS+TC-WeM12
Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition of Hydrophobic Thin Film Coatings Using Liquid Precursors

Wednesday, October 31, 2012, 11:40 am, Room 24

Session: Atmospheric Plasma Processing for PV, Flexible Electronics (incl. R2R)
Presenter: J. Yim, U.S. Army Research Laboratory
Authors: J. Yim, U.S. Army Research Laboratory
V. Rodriguez-Santiago, U.S. Army Research Laboratory
A. Williams, U.S. Army Research Laboratory
J. Hirvonen, U.S. Army Research Laboratory
D. Pappas, U.S. Army Research Laboratory
Correspondent: Click to Email

Hydrophobic coatings are known to impart self-cleaning, anti-fouling, anti-fog and wicking properties on polymeric substrates and textiles. These coatings are largely derived from either wet chemical methods or low pressure plasma-based chemical vapor deposition techniques using gaseous precursors. In an effort to eliminate the use of large quantities of chemicals and solvents associated with wet chemistries and to deter the use of costly vacuum systems, we explored the practicality of an atmospheric pressure plasma jet (APPJ) as a comparable alternative to low pressure plasma systems. To obtain coatings typically achieved through wet chemistry, and often limited by commonly used fluorocarbon gases such as C3F6, liquid fluorinated precursors such as fluoroalkyl silanes (FAS) were explored. FAS with varying fluorocarbon chain lengths were studied and deposition conditions as a function of electrode-substrate gap distance, deposition time and power were investigated. Ultra high molecular weight polyethylene (UHMWPE) films served as the model polymer system in which the coatings were deposited owing to its simple molecular structure consisting of -CH2-CH2- chains. The characteristic properties of the coatings on UHMWPE such as hydrophobicity, chemical composition, uniformity and deposition rates were studied to establish a correlation between processing parameters and the coating properties. X-ray photoelectron spectroscopy (XPS) and attenuated total reflectance-Fourier transform infrared spectroscopy (ATR-FTIR) measurements confirmed the presence of CF, CF2, and CF3 functionalities in the coating composition and reveal that there is a strong dependence of these groups on the chain length of fluorocarbon groups in the FAS precursors. Water contact angle (WCA) measurements confirm hydrophobicity of the coating, where angles over 90° were recorded. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) techniques were utilized to probe the morphological profiles of the coatings. Profilometry and ellipsometry show deposition rates of the coating ranging from nanometer to sub-micrometer thick coatings. Results show that the use of APPJ with liquid precursors is promising in achieving hydrophobic coatings under atmosphere without producing large volumes of hazardous waste.