AVS 59th Annual International Symposium and Exhibition
    In Situ Microscopy and Spectroscopy Focus Topic Wednesday Sessions

Session IS+AS+OX+ET-WeM
In Situ Characterization of Solids: Film Growth, Defects, and Interfaces

Wednesday, October 31, 2012, 8:00 am, Room 007
Moderator: P.W. Sutter, Brookhaven National Laboratory


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am IS+AS+OX+ET-WeM1
Revealing Gas-Surface Radical Reaction Mechanisms of Self-Assembled Monolayers by Scanning Tunneling Microscopy
D.Y. Lee, M.M. Jobbins, S.A. Kandel, University of Notre Dame
8:20am IS+AS+OX+ET-WeM2
In Situ Imaging of the Nucleation and Growth of Epitaxial Anatase TiO2(001) Films on SrTiO3(001)
Y.G. Du, D.J. Kim, T.C. Kaspar, Pacific Northwest National Laboratory, S.E. Chamberlin, University of Wisconsin Milwaukee, I. Lyubinetsky, S.A. Chambers, Pacific Northwest National Laboratory
8:40am IS+AS+OX+ET-WeM3 Invited Paper
In Situ Synchrotron X-Ray Studies of Epitaxial Oxide Thin Film Synthesis Behavior
J.A. Eastman, M.J. Highland, P.H. Fuoss, Argonne National Laboratory, T.M. McCleskey, Los Alamos National Laboratory, D.D. Fong, C.M. Folkman, S.K. Keun, E. Perret, P.M. Baldo, Argonne National Laboratory, E. Bauer, Q. Jia, Los Alamos National Laboratory
9:40am IS+AS+OX+ET-WeM6
Understanding the Dynamic Electronic Properties of Electrode Materials by In Situ X-ray Absorption Spectroscopy
M. Bagge-Hansen, J.R.I. Lee, A. Wittstock, M.D. Merrill, M.A. Worsley, T. Ogitsu, B.C. Wood, T. Baumann, M. Stadermann, M. Biener, J. Biener, T. van Buuren, Lawrence Livermore National Laboratory
10:40am IS+AS+OX+ET-WeM9
In Situ Studies of Al2O3 ALD Growth and Self-cleaning on III-V Surfaces by STM and XPS
L.N.J. Rodriguez, A. De Clercq, IMEC, Belgium, M. Tallarida, BTU Cottbus, Germany, D. Cuypers, IMEC, Belgium, J.P. Locquet, KU Leuven, Belgium, S. Van Elshocht, C. Adelmann, M. Caymax, IMEC, Belgium
11:00am IS+AS+OX+ET-WeM10
In Situ Transport Measurement of Kinetically Controlled Bi Atomic Layers
Y. Fujikawa, E. Saitoh, Tohoku University, Japan
11:20am IS+AS+OX+ET-WeM11
CAMECA IMS Series Advanced Ion Microscopy: High Throughput, Repeatability & Automation
P. Peres, F. Desse, F. HIllion, M. Schuhmacher, Cameca, S.a., France, A.N. Davis, CAMECA Instruments, Inc.