AVS 59th Annual International Symposium and Exhibition
    Helium Ion Microscopy Focus Topic Thursday Sessions

Session HI+AS+BI+NS-ThM
Imaging and Lithography with the Helium Ion Microscope

Thursday, November 1, 2012, 8:00 am, Room 19
Moderators: A. Gölzhäuser, University of Bielefeld, Germany, V.S. Smentkowski, General Electric Global Research Center


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Click a paper to see the details. Presenters are shown in bold type.

8:40am HI+AS+BI+NS-ThM3 Invited Paper
Helium Ion Microscopy of Photonic Structures in Biological Systems
S.A. Boden, A. Asadollahbaik, H.N. Rutt, D.M. Bagnall, University of Southampton, UK
9:20am HI+AS+BI+NS-ThM5
Imaging of Carbon Nanomembranes (CNM) and Graphene with Helium Ion Microscopy
H. Vieker, A. Beyer, A. Polina, A. Willunat, N.-E. Weber, M. Büenfeld, A. Winter, X. Zhang, M. Ai, A. Turchanin, A. Gölzhäuser, Bielefeld University, Germany
10:40am HI+AS+BI+NS-ThM9 Invited Paper
Dopant Contrast in Helium Ion Microscopy
Y. Chen, H. Zhang, D. Fox, C.C. Faulkner, J. Wang, J. Boland, J. Donegan, Trinity College, Ireland
11:20am HI+AS+BI+NS-ThM11
High Resolution Patterning of Carbon Nanomembranes and Graphene via Extreme UV Interference Lithography: A Helium Ion Microscopy Study
A. Winter, A. Willunat, A. Beyer, University of Bielefeld, Germany, Y. Ekinci, Paul Scherrer Institute, Switzerland, A. Gölzhäuser, A. Turchanin, University of Bielefeld, Germany
11:40am HI+AS+BI+NS-ThM12
Application of Helium Ion Microscope on Processing and Characterization of Nano Wires
H.X. Guo, S. Nagano, K. Onishi, D. Fujita, National Institute for Materials Science (NIMS), Japan