| AVS 59th Annual International Symposium and Exhibition | |
| Helium Ion Microscopy Focus Topic | Thursday Sessions |
| Session HI+AS+BI+NS-ThM |
| Session: | Imaging and Lithography with the Helium Ion Microscope |
| Presenter: | H. Vieker, Bielefeld University, Germany |
| Authors: | H. Vieker, Bielefeld University, Germany A. Beyer, Bielefeld University, Germany A. Polina, Bielefeld University, Germany A. Willunat, Bielefeld University, Germany N.-E. Weber, Bielefeld University, Germany M. Büenfeld, Bielefeld University, Germany A. Winter, Bielefeld University, Germany X. Zhang, Bielefeld University, Germany M. Ai, Bielefeld University, Germany A. Turchanin, Bielefeld University, Germany A. Gölzhäuser, Bielefeld University, Germany |
| Correspondent: | Click to Email |
We present a Helium Ion Microscopy (HIM) study of carbon nanomembranes (CNMs). CNMs are extremely thin (~1 nm) nanolayers consisting only of surface. They are made via cross-linking of self-assembled monolayers (SAMs) with large-area exposures of electrons, photons or helium ions and a subsequent transfer to suitable substrates. Patterned radiation exposures allow the fabrication of perforated nanomembranes, e.g., nanosieves. After annealing at temperatures above 800K, CNMs become conductive and eventually transform into graphene. HIM images of CNMs with different precursor molecules are shown, and images of graphene from SAMs are compared with the CVD grown graphene. Capabilities of the HIM imaging of freestanding CNMs and graphene will be discussed.