| AVS 58th Annual International Symposium and Exhibition | |
| Plasma Science and Technology Division | Wednesday Sessions |
| Session PS+SS-WeM |
| Session: | Plasma Surface Interactions (Fundamentals & Applications) I |
| Presenter: | Nathan Marchack, University of California Los Angeles |
| Authors: | N. Marchack, University of California Los Angeles C.D. Pham, University of California Los Angeles J.P. Chang, University of California Los Angeles |
| Correspondent: | Click to Email |
As the downscaling of integrated circuit devices continues, minute variations in the feature profiles from processing techniques such as plasma etching significantly affect device performance. With the increasing introduction of novel materials into integrated circuits, the need to predict surface response during etching of these materials, such as complex oxides, becomes critical to attainable device performance. In this work, a phenomenological model1 based on high-k oxide etching in chlorine based plasmas is adapted into a translated mixed layer (TML)2 kinetics-based format to be used a Monte Carlo-based feature profile simulator. To accurately represent the kinetics involved, experiments are conducted in this work in an inductively coupled plasma (ICP) reactor equipped with a quadrupole mass spectrometer (QMS) for analyzing etch products and a quartz crystal microbalance (QCM) for measuring the etch rate in situ. This reactor is connected to a UHV transfer tube which allows the surface composition to be studied via x-ray photoelectron spectroscopy (XPS) without exposure to ambient conditions. In the TML model, surface reactions such as ion impingement, neutral adsorption, physical sputtering and chemically enhanced ion etching are accounted for, and reaction parameters are either measured directly or extracted by comparing the model to etch yield data. The MC model used ion incident angle dependence and an elliptical energy deposition model to capture the effects of surface morphology on the profile evolution under the bombardment of energetic and directional ions. The material systems studied include HfLaO and HfSiON etched in Cl2/BCl3 plasmas, for both blanket films and trenches patterned by e-beam lithography. Very good agreement was demonstrated between the phenomenological and TML models, as well as between simulated profiles and cross-sectional SEM images of the patterned material systems.
1 Martin et al. Journal of Vacuum Science and Technology A 27(2) 2009
2 Kwon et al. Journal of Vacuum Science and Technology A. 24(5) 2006