| AVS 57th International Symposium & Exhibition | |
| Plasma Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS2-WeA1 Invited Paper Possible Applications of Neutral Beam Generated by Low Angle Reflection of a Reactive Ion Beam to Nanoscale Semiconductor Processing G.Y. Yeom, Sungkyunkwan University, Republic of Korea |
| 2:40pm | PS2-WeA3 Numerical Simulation of Neutral Beam Generation by Quantum Electrons Dynamics N. Watanabe, S. Ohtsuka, T. Iwasaki, K. Ono, Mizuho Information & Research Institute, Inc., Japan, Y. Iriye, O. Nukaga, S. Ueki, T. Kubota, M. Sugiyama, BEANS Project 3D BEANS Center and University of Tokyo, Japan, S. Samukawa, BEANS Project 3D BEANS Center and Tohoku University, Japan |
| 3:00pm | PS2-WeA4 Development of a Defect-Free GaAs/AlGaAs Heterostructure Etching Process Utilizing Chlorine and Argon Mixed Neutral Beam X.Y. Wang, C.H. Huang, Y. Ohno, M. Igarashi, Tohoku University, Japan, A. Murayama, Hokkaido University, Japan, S. Samukawa, Tohoku University, Japan |
| 4:00pm | PS2-WeA7 Development of Sputter and CVD using the Hyperthermal Neutral Beam B.J. Lee, S.W. Choi, D.C. Kim, J.S. Kim, K.S. Oh, S.J. Yoo, National Fusion Research Institute, Republic of Korea, J.N. Jang, Y.J. Lee, M.P. Hong, Korea University, Republic of Korea, Y.C. Park, Handong Global University, Republic of Korea |
| 4:20pm | PS2-WeA8 Silicon Etching using Large Diameter Neutral Beam Source T. Kubota, BEANS Project 3D BEANS Center and University of Tokyo, Japan, S. Ueki, BEANS Project 3D BEANS Center, Japan, O. Nukaga, M. Sugiyama, BEANS Project 3D BEANS Center and University of Tokyo, Japan, H. Ohtake, Tohoku University, Japan, S. Samukawa, BEANS Project 3D BEANS Center and Tohoku University, Japan |
| 4:40pm | PS2-WeA9 Microwave Plasma Source for the High Flux Hyperthermal Neutral Beam B.J. Lee, H.J. You, S.W. Jang, Y.H. Jung, D.W. Kim, M. Koo, National Fusion Research Institute, Republic of Korea, Y.C. Park, J.T. Kim, Handong Global University, Republic of Korea |
| 5:00pm | PS2-WeA10 Low Temperature, Lattice-plane-free, Anisotropic and Damage-free Oxidation by Neutral Beam Technology A. Wada, Tohoku University, Japan, K. Endo, M. Masahara, S. Yamasaki, National Institute of Advanced Industrial Science and Technology (AIST), Japan, S. Samukawa, Tohoku University, Japan |
| 5:20pm | PS2-WeA11 Structure-designable Method to form Super low-k SiOC Film by Neutral-Beam-Enhanced Chemical Vapour Deposition T. Sasaki, S. Yasuhara, Tohoku University, Japan, T. Shimayama, K. Tajima, H. Yano, S. Kadomura, M. Yoshimaru, N. Matsunaga, Semiconductor Technology Academic Research Center (STARC), Japan, S. Samukawa, Tohoku University, Japan |