AVS 57th International Symposium & Exhibition
    Plasma Science and Technology Wednesday Sessions
       Session PS2-WeA

Paper PS2-WeA9
Microwave Plasma Source for the High Flux Hyperthermal Neutral Beam

Wednesday, October 20, 2010, 4:40 pm, Room Galisteo

Session: Neutral Beam Processing
Presenter: H.J. You, National Fusion Research Institute, Republic of Korea
Authors: B.J. Lee, National Fusion Research Institute, Republic of Korea
H.J. You, National Fusion Research Institute, Republic of Korea
S.W. Jang, National Fusion Research Institute, Republic of Korea
Y.H. Jung, National Fusion Research Institute, Republic of Korea
D.W. Kim, National Fusion Research Institute, Republic of Korea
M. Koo, National Fusion Research Institute, Republic of Korea
Y.C. Park, Handong Global University, Republic of Korea
J.T. Kim, Handong Global University, Republic of Korea
Correspondent: Click to Email
In order to incident the high flux of Hyperthermal Neutral Beam (HNB) on the substrate the high plasma density and the shortest distance between the reflector, which converts ions to neutrals, namely neutralizer, and the substrate are required. ECR plasma source can both requirements. This presentation shows the features of ECR plasmas due to the Lisitano antenna, the vertical slotted antenna (VSLAN), the incline slotted antenna (ISLAN), and the rectangular slotted antenna (RESLAN) for the scanning type CVD. The characteristics of HNB Cu sputter for the Cu seed layer for Cu interconnect line of semiconductor as an application of plasma source from Lisitano antenna and HNB Al sputter for the thin film deposition of Al2O3 as one from RESLAN are also presented.