| AVS 56th International Symposium & Exhibition | |
| Thin Film | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | TF-ThA2 Resonant Infrared Matrix-Assisted Pulsed Laser Ablation of Electroluminescent Dendrimer Thin Films R.D. Torres, University of Florida, S.L. Johnson, Vanderbilt University, J. Hwang, University of Florida, P.L. Burn, University of Queensland, Australia, R.F. Haglund, Vanderbilt University, P.H. Holloway, University of Florida |
| 2:40pm | TF-ThA3 Invited Paper Etching Technology for Patterned Media used for Ultra High Density Hard Disk Drive D.D. Djayaprawira, Shinde, Canon-ANELVA Corporation, Japan |
| 3:40pm | TF-ThA6 Resonant Infrared Pulsed Laser Deposition of Organic Materials for Display Applications H.K. Park, AppliFlex LLC, K.E. Schriver, R.F. Haglund, Vanderbilt University |
| 4:00pm | TF-ThA7 Room Temperature Synthesis of Silica and SiO2-TiO2 Composites for use as Barrier and Anti-Reflection Coatings P.C. Rowlette, C.A. Wolden, Colorado School of Mines |
| 4:20pm | TF-ThA8 Expanding Thermal Plasma Deposition of a-Si:H Thin Films for Surface Passivation of c-Si Wafers A. Illiberi, V. Verlaan, M. Creatore, W.M.M. Kessels, M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands |
| 4:40pm | TF-ThA9 Effect of Oxygen Incorporation on the Properties of CdS/CdTe Interface and the Device Properties R.G. Dhere, J.N. Duenow, S.E. Asher, Y. Yan, M. Young, T.A. Gessert, National Renewable Energy Laboratory |
| 5:00pm | TF-ThA10 Large-Scale Simulations of Nanoimprint Lithography M. Chandross, G.S. Grest, Sandia National Laboratories |
| 5:20pm | TF-ThA11 All through Stencil MOSFET Fabrication L.G. Villanueva, O. Vazquez-Mena, EPFL, Switzerland, J. Montserrat, IMB-CNM-CSIC, Spain, K. Sidler, V. Savu, EPFL, Switzerland, J. Bausells, IMB-CNM-CSIC, Spain, J. Brugger, EPFL, Switzerland |