| AVS 56th International Symposium & Exhibition | |
| Plasma Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| PS-ThP1 3D Numerical Modeling and Experimental Characterization of Internal Antenna Type Inductively Coupled Plasma System for Nitriding of Bipolar Plates for PEMFC(Polymer Electrolyte Membrane Fuel Cell) J. Joo, W. Yang, Kunsan National University, Republic of Korea, J. Lee, Seoul National University, Republic of Korea |
| PS-ThP2 Multidimensional Plasma Simulations of an SF6/O2 Etch J. Tennyson, S. Harrison, University College London, UK, J.J. Munro, D. Brown, Quantemol, UK |
| PS-ThP3 Semi-analytical Model of Standing Wave and Skin Effect in Large-area RF Discharges M. Klick, Plasmetrex, Germany |
| PS-ThP4 U-shaped Internal Inductively Coupled Plasma Source with a Ferrite Module for Roll-to-Roll Processing S.P. Hong, J.H. Lim, K.N. Kim, G.Y. Yeom, Sungkyunkwan University, Korea |
| PS-ThP5 Self-Consistent Electrodynamics of Very High Frequency Plasma Discharge Chambers Z. Chen, J.A. Kenney, S. Rauf, K. Collins, Applied Materials, Inc. |
| PS-ThP6 Characterization of a Power Splitter for Multi-Tile Plasma Source for VHF/UHF PECVD Film Growth A.R. Ellingboe, Dublin City University, Ireland, T. Michna, Phive Plasma Technologies, Ireland |
| PS-ThP7 Experimental and Numerical Investigations of a Hollow Cathode Plasma Source for Microcrystalline Silicon Deposition F.C. Tung, ITRI/MSL, Taiwan, R.O.C., T.C. Wei, Chung Yuan University, Taiwan, R.O.C., S.W. Chau, National Taiwan University of Science and Technology, R.O.C., P.S. Wu, ITRI/MSL, Taiwan, R.O.C, C.-H. Lin, Chung Yuan University, Taiwan, R.O.C. |
| PS-ThP8 Novel Long Linear-Type Microwave Plasma Source C.C. Chang, Industrial Technology Research Institute, Taiwan |
| PS-ThP9 Time Resolved Energy Distributions for Positive Ions in an Inductively-Coupled Plasma Reactor J.A. Rees, C.L. Greenwood, D.L. Seymour, Hiden Analytical, UK |
| PS-ThP10 Influence of Sheath on Measurement of Electron Density in Frequency Shift Probe and its Application to Measurement of Electron Temperature K. Nakamura, Q. Zhang, H. Sugai, Chubu University, Japan |
| PS-ThP11 High Performance of Compact Combinatorial Etching Process for Next Generation Plama Nano-Process Ch.S. Moon, K. Takeda, Nagoya University, Japan, Y. Setsuhara, Osaka University, Japan, M. Shiratani, Kyushu University, Japan, M. Sekine, M. Hori, Nagoya University, Japan |
| PS-ThP12 Tailoring of Substrate RF Bias Voltage Waveform for Arbitrary Energy Distributions of Bombarding Ions in Plasma Processing: Ion Energy Measurements X.V. Qin, Y.-H. Ting, A.E. Wendt, University of Wisconsin-Madison |
| PS-ThP13 Measurement of Electron Energy Probability Function in Dual-Frequency Capacitive Discharges S.K. Ahn, H.Y. Chang, Korea Advanced Institute of Science and Technology |
| PS-ThP14 Time-resolved Fast Imaging of the Arcing in RF Discharge Y.H. Kim, H.S. Lee, H.Y. Chang, KAIST, Korea |
| PS-ThP15 Design of a Kalman Filter for Plasma Process State Estimation and Control B.J. Keville, M.M. Turner, Dublin City University, Ireland |
| PS-ThP16 Contamination Detection through OES in Conductor Dry Etch Process C. Bevilacqua, A. Marchelli, P. Petruzza, G. Fazio, Numonyx |
| PS-ThP17 Spatial Evolution of the Electron Energy Distribution Function in a Microwave Surface-Wave Plasma J.P. Zhao, R.V. Bravenec, L. Chen, M. Funk, R. Sundararajan, Tokyo Electron America, Inc., C.Z. Tian, K. Ishibashi, T. Nozawa, Tokyo Electron Technology Development Institute, Japan |
| PS-ThP18 Diagnostic Study of an rf-capacitively Coupled Plasma: The Breakdown of the Periphery Gap Regime H.W. Chang, C.C. Hsu, National Taiwan University, Taiwan |
| PS-ThP19 Real-Time Feedback Control of Radical Species by OES in a VHF Plasma for Microcrystalline Silicon Thin Film Deposition C.H. Chang, C.C. Du, M.W. Liang, J.R. Huang, Industrial Technology Research Institute, Taiwan, Y.L. Chang, K.C. Leou, National Tsing Hua University, Taiwan |