Paper PS-ThP4
U-shaped Internal Inductively Coupled Plasma Source with a Ferrite Module for Roll-to-Roll Processing

Thursday, November 12, 2009, 6:00 pm, Room Hall 3

Flexible display devices are being investigated by many researchers as a potential next-generation display. Roll-to-roll plasma processing is one of the important techniques for flexible display processing. For the fabrication of flexible display devices by the roll-to-roll plasma processing, not only highly uniform plasma processing but also high processing rates are required to increase the throughput of the processing. In particular, for the use of low-temperature substrates such as plastic substrates, the processing at the temperature lower than 100 ℃ is required.

In this work, we present a line-type, high-density plasma source composed of a U-shaped internal antenna for an inductively coupled plasma (ICP) operated at 2 MHz and with a ferrite module installed on the antenna of the ICP source. The 2300 mm long χ 740mm wide ICP source showed the plasma density of about 3.1 χ 10¹¹cm^-3 at 3.5kW with the plasma uniformity less than 11% along the antenna line. The plasma characteristics of the source were measured using a Langmuir probe (Hiden Analytical Inc., ESP), and the electrical properties of the line-type, internal antenna were measured using an impedance analyzer (MKS Inc.).