| AVS 53rd International Symposium | |
| Nanometer-scale Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | NS+NM-WeA1 Direct Deposition of Ordered Polymer Nanostructures in UHV via thermal Dip-Pen Nanolithography P.E. Sheehan, M. Yang, A.R. Laracuent, Naval Research Laboratory, B.A. Nelson, W.P. King, Georgia Tech, L.J. Whitman, Naval Research Laboratory |
| 2:20pm | NS+NM-WeA2 Multiplexed Electroless Nanopatterning of Metallic Arrays Via Scanning Probe Lithography S.A. Backer, University of California, Berkeley, M. Rolandi, University of California, Lawrence Berkeley National Laboratory, D. Okawa, University of California, Berkeley, J.M.J. Fréchet, University of California, Lawrence Berkeley National Laboratory |
| 3:00pm | NS+NM-WeA4 High-Density Gigabit Patterning of Sub-100nm Circular Hole/Dot Arrays by Nanoimprint Lithography W. Hu, R.J. Wilson, L. Xu, S.J. Han, S.X. Wang, Stanford University |
| 3:20pm | NS+NM-WeA5 Invited Paper Advances in Nanostructure Fabrication Technology G. Willson, M. Stewart, The University of Texas, Austin |
| 4:00pm | NS+NM-WeA7 Photolithography Beyond the Diffraction Limit G.J. Leggett, University of Sheffield, UK |
| 4:20pm | NS+NM-WeA8 SPM Nanolithography of ZrN Thin Films: Nitrogen-Enhanced Growth and Hollow Oxide Feature Formation N. Farkas, E.A. Evans, R.D. Ramsier, The University of Akron, J.A. Dagata, National Institute of Standards and Technology |
| 4:40pm | NS+NM-WeA9 High Resolution Electron Beam Induced Etching of Extreme Ultraviolet (EUV) Lithography Mask Films M.G. Lassiter, P.D. Rack, University of Tennessee, T. Liang, Intel Corp. |