AVS 53rd International Symposium
    Nanometer-scale Science and Technology Wednesday Sessions
       Session NS+NM-WeA

Paper NS+NM-WeA2
Multiplexed Electroless Nanopatterning of Metallic Arrays Via Scanning Probe Lithography

Wednesday, November 15, 2006, 2:20 pm, Room 2016

Session: Nanolithography and Patterning
Presenter: S.A. Backer, University of California, Berkeley
Authors: S.A. Backer, University of California, Berkeley
M. Rolandi, University of California, Lawrence Berkeley National Laboratory
D. Okawa, University of California, Berkeley
J.M.J. Fréchet, University of California, Lawrence Berkeley National Laboratory
Correspondent: Click to Email
Direct surface patterning of metallic species is essential for the fabrication of ever smaller nanostructures, such as electrodes, magnetic data storage devices and specific catalytic sites for localized chemical reactions. Conventional lithographic techniques based on radiation can achieve remarkable resolution and pitch. However, limitations lie in the multiplexing capabilities with the need of a separate alignment and lithography step for each metal deposited. We present a multiplexed lithographic technique based on the localized surface modification of silicon using an atomic force microscope (AFM) in fluid. The sharp tip of the AFM is used to create pinhole defects in the thin oxide present on the silicon surface. Spontaneous electroless deposition of the metal ions dissolved in the fluid occurs at the defect sites creating metallic islands as small at tens of nanometers. We demonstrate the fabrication of high pitch arrays of as many as thousands of islands of Au, Co, Sn and Fe. By consecutively exposing a sample to various metallic salts in solution, nano islands composed of different metals can be deposited in a single patterning session without needing to realign the sample or change the probe. This allows for the fabrication of multiplexed intergiditated arrays of nanostructures that could be used for orthogonal catalysis.