AVS 53rd International Symposium
    Nano-Manufacturing Topical Conference Tuesday Sessions

Session NM-TuP
Nano-Manufacturing Poster Session

Tuesday, November 14, 2006, 6:00 pm, Room 3rd Floor Lobby


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

NM-TuP1
Glass Nanoimprint using Amorphous Ni-P Mold Etched by Focused Ion Beam
H. Mekaru, National Institute of Advanced Industrial Science and Technology (AIST), Japan, T. Kitadani, SAWA PLATING CO.,LTD., Japan, M. Yamashita, Hyogo Prefectural Institute of Technology, Japan, M. Takahashi, National Institute of Advanced Industrial Science and Technology (AIST), Japan
NM-TuP2
Annealing Effect of Structural, Morphological and Optical Properties on Reactive Sputtered WO@sub3@ Films for Mediated Heterogeneous Photocatalyst
K. Prabakar, T. Takahashi, K. Takahashi, T. Nezuka, University of Toyama, Japan, T. Nakashima, Kashiwa Chuo High School, Japan, Y. Kubota, University of Yokohama City, Japan, A. Fujishima, Kanagawa Academy of Science and Technology, Japan
NM-TuP3
High-K HfO@sub 2@ Nanotube Fabrication using Template Synthesis and Atomic Layer Deposition
I. Perez, E. Robertson, L. Henn-Lecordier, H. Yi, S.J. Son, S.B. Lee, G.W. Rubloff, University of Maryland, College Park
NM-TuP4
Fabrication of Titanium Oxide Nanotubes by Anodization
K. Ishibashi, H. Sato, R. Yamaguchi, Y. Kimura, M. Niwano, Tohoku University, Japan
NM-TuP5
Fabrication of Nanometer-scale Holes Based on a Plasma Ashing and Selective Liquid Phase Deposition
K.S Kim, Y. Roh, Sungkyunkwan University, Republic of Korea
NM-TuP6
Fabrication of Binary Nano/Micro Sized Domain Composed of Alkyl and Fluoroalkylsilane Self-Assembled Monolayer
S.H. Lee, T. Ishizaki, N. Saito, O. Takai, Nagoya University, Japan
NM-TuP7
Molecular-Beam Epitaxy of InN Quantum Dots on Nitrided Sapphire
Y.E. Romanyuk, R.-G. Dengel, S.R. Leone, University of California at Berkeley and Lawrence Berkeley National Laboratory
NM-TuP8
AFM Tip-Characterizer Fabricated from Compound Semiconductor Superlattices
H. Itoh, T. Fujimoto, S. Ichimura, RIIF-AIST, Japan