AVS 53rd International Symposium
    Nano-Manufacturing Topical Conference Tuesday Sessions
       Session NM-TuP

Paper NM-TuP6
Fabrication of Binary Nano/Micro Sized Domain Composed of Alkyl and Fluoroalkylsilane Self-Assembled Monolayer

Tuesday, November 14, 2006, 6:00 pm, Room 3rd Floor Lobby

Session: Nano-Manufacturing Poster Session
Presenter: S.H. Lee, Nagoya University, Japan
Authors: S.H. Lee, Nagoya University, Japan
T. Ishizaki, Nagoya University, Japan
N. Saito, Nagoya University, Japan
O. Takai, Nagoya University, Japan
Correspondent: Click to Email
Self-assembled monolayers (SAMs) have attracted attention from a viewpoint of the functional surface modification such as physical, chemical and biological surface. In order to apply these SAMs to the practical application, it is vital to use lithography processes. Recently, several advances have been made in lithography methods for modifying functional groups on monolayer surfaces. Also, we have successfully fabricated functional surface with two different types of functional groups by modifying locally on an organosilane SAM by using vacuum ultraviolet (VUV) irradiation and scanning probe chemical conversion. However, the method was useful for specific surface functional group, the versatility was extremely low. In order to overcome the issue, it is required to establish more simple method. Here, we report a simple method to fabricate binary nano/micro sized domain composed of alkyl and fluoroalkylsilane SAM without lithography process. An octadecyltrichlorosilanes (OTS) and heptadecafluoro-1,1,2,2-tetra-hydrodecyltrichlorosilane (FOETS) were used as precursor molecules. Toluene (anhydrous, 99.8%) were used as the solvent. First, OTS-SAM domains structures were prepared on the silicon (111) substrates through a liquid phase method. In order to control the sizes of OTS-SAM domain structures, the deposition conditions were changed. The humidity and temperature conditions were changed from 5% to 50% and 5°C to 40 °C, respectively. After OTS-SAM preparation, the FOETS-SAM was prepared on the silicon oxide uncovered with OTS-SAM. The humidity and temperature conditions for FOETS-SAM were 50% and 20°, respectively. We found that the preparation conditions allowed us to control of the OTS-SAM domain size. And we confirmed that nano/micro sized domain composed of alkyl and fluoroalkylsilane SAM was formed on the silicon oxide substrate by using atomic force microscope (AFM) and Kelvin probe force microscope (KPFM).