| AVS 53rd International Symposium | |
| Exhibitor Workshop | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 12:20pm | EW-TuL1 Applications of a New TOF-SIMS Tool for 300 mm Wafer Inspection E. Niehuis, R. Moellers, T. Grehl, D. Rading, F. Kollmer, ION-TOF GmbH, Germany |
| 12:40pm | EW-TuL2 Advantages of the Delay-Line Dector for XPS Imaging D. Surman, C. Blomfield, S. Page, Kratos Analytical |
| 1:00pm | EW-TuL3 A New End-Hall Ion Source with Improved Performance L. Mahoney, D. Burtner, D. Siegfried, C. Dale, Veeco Instruments Inc. |
| 1:20pm | EW-TuL4 Next Generation Commercial LEEM FE-LEEM P90 B. Achilles, A. Berghaus, SPECS GmbH, Germany |
| 1:40pm | EW-TuL5 BOCCT Magnet Retrofit Assemblies M. Bernick, J. Hrebik, Angstrom Sciences, Inc. |
| 2:00pm | EW-TuL6 K-Alpha, A New Approach to X-ray Photoelectron Spectroscopy (XPS) J. Miller, , R.G. White, Thermo Electron Corporation, UK |