| AVS 53rd International Symposium | |
| Applied Surface Science | Friday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | AS-FrM1 Probing Interactions of Ge with Chemical and Thermal SiO@sub 2@ to Understand Selective Growth of Ge on Si during Molecular Beam Epitaxy Q. Li, University of New Mexico, J.L. Krauss, University of Wisconsin Madison, S. Hersee, S.M. Han, University of New Mexico |
| 8:20am | AS-FrM2 Chemical Vapor Deposition of WN@sub x@C@sub y@ from Cl@sub 3@[Me@sub 2@NC(N@super i@Pr)@sub 2@]W(N@super i@Pr): Film Characterization and Evaluation for Diffusion Barrier Application H.A. Ajmera, A.T. Heitsch, L.L. Reitfort, C.B. Wilder, L. McElwee-White, T.J. Anderson, University of Florida |
| 8:40am | AS-FrM3 RBS, ERDA and XPS Study of Ca0.28Ba0.72Nb2O6 Epitaxial Thin Films Prepared by PLD for Electro-Optical Applications P.F. Ndione, M. Kaidi, C. Durand, M. Chaker, R. Morandotti, Université du Québec, Canada |
| 9:00am | AS-FrM4 Ion-Induced Effects during Reactive Sputter Deposition of ITO Films at the RF-biased Electrode A. Amassian, Cornell University, M. Dudek, O. Zabeida, J.E. Klemberg-Sapieha, L. Martinu, Ecole Polytechnique de Montreal, Canada |
| 9:20am | AS-FrM5 Electrospray Deposition of Macro-Molecular Thin Films in High Vacuum Directly From Solution for Surface Science Applications M.M. Beerbom, Y. Yi, J.E. Lyon, A.J. Cascio, J.P. Magulick, R. Schlaf, University of South Florida |
| 9:40am | AS-FrM6 Characterization of Island Growth during Initial Stages of Atomic Layer Deposition of WNx on SiO2 B.A. Carlson, N. Ramaswamy, P. Mrozek, S. Hues, Micron Technology |
| 10:00am | AS-FrM7 Invited Paper Structural Characterization of HfO@sub 2@ Based Silicon CMOS Stacks M. Copel, IBM Research Division |
| 10:40am | AS-FrM9 Back Side SIMS Depth Profile Analysis of a High-k Dielectric Material F.A. Stevie, R. Garcia, Z. Zhu, North Carolina State University, P. Sivasubramani, R.M. Wallace, University of Texas at Dallas, D.P. Griffis, North Carolina State University |
| 11:00am | AS-FrM10 Copper Diffusion Barrier Performance of PEALD TaSiNC W. Zeng, E.T. Eisenbraun, University at Albany - The State University of New York |
| 11:20am | AS-FrM11 Synthesis and Characterization of Nanoscale Al-Si-O Gradient Membranes for Gas Analytical Microdevices M. Bruns, V. Trouillet, E. Nold, Forschungszentrum Karlsruhe GmbH, Germany, R.G. White, Thermo Electron Corporation, England |
| 11:40am | AS-FrM12 Studies of Vanadium Pentoxide Thin Films as a Function of Number of Lithium Ion Intercalation Cycles J.E. Castle, University of Surrey, UK, A.M. Salvi, N Ibris, Universita' della Studi della Basilicata, Italy, D. Alamarguy, Laboratoire de Genie Electrique de Paris, France |