AVS 52nd International Symposium
    Thin Films Wednesday Sessions
       Session TF+EM-WeM

Invited Paper TF+EM-WeM8
Linear Nanomechanical Measurements using a Novel AFM Technique

Wednesday, November 2, 2005, 10:40 am, Room 310

Session: In-Situ/ Ex-Situ & Real- Time Monitoring
Presenter: P.M. Hoffmann, Wayne State University
Correspondent: Click to Email

Atomic Force Microscopy has been extensively used to study roughness, adhesion and mechanical properties of surfaces and thin films. However, commonly used AFM techniques suffer from a variety of problems inherent to the technique: Snap-in instabilities in static AFM and non-linearities in dynamic AFM measurements. Here we present a new AFM technique that avoids these problems and is capable of stable, linear measurements of many systems, including atomic scale contact mechanics and atomic friction on surfaces. I will introduce the technique and present recent results, especially the finding that continuum mechanics applies in atomic contacts even if the number of atoms in the contact becomes very low and the observation of friction due to a single atomic defect.