AVS 52nd International Symposium
    Nanometer-Scale Science and Technology Wednesday Sessions
       Session NS-WeA

Paper NS-WeA1
Molecular Ruler Lithography Process with Sacrificial Multilayer Host Structures Incorporating a Barrier Layer

Wednesday, November 2, 2005, 2:00 pm, Room 210

Session: Nanopatterning and Manipulation
Presenter: S. Subramanian, Pennsylvania State University
Authors: S. Subramanian, Pennsylvania State University
J.M. Catchmark, Pennsylvania State University
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Molecular ruler lithography has the potential of improving the achievable resolution of conventional lithography techniques, without resorting to new instrumentation. This is accomplished by scaling down the dimensions of functional host structure by selectively assembling organic molecules of precise length on their surface.@footnote1@ A novel method for performing molecular ruler lithography using sacrificial host structures has recently been developed and demonstrated using contact lithography.@footnote2@ This new approach provides a reproducible,high yield technique for selective removal of the host,fabricating high aspect ratio structures and isolation of the host material from the substrate. In order to make this process widely compatible with optical and electron beam lithography techniques, we introduce a modified molecular ruler lithography process using a sacrificial multilayer host structure which incorporates a barrier layer in between the sacrificial and the host material. This barrier layer prevents the lithography resist,developer and removal chemistries used to pattern the host material from interacting with the sacrificial material. We demonstrate this process by using contact lithographically patterned gold host structures to produce isolated platinum lines. The process consisted of depositing a sacrificial LOR resist (MicroChem) and a chrome barrier layer. A gold host feature was patterned on top of the chrome barrier layer using optical lithography. The chrome barrier was then selectively removed using reactive ion etching. Mercaptohexadeconoic acid molecules were assembled onto the patterned gold layer completing the fabrication of the sacrificial host structure. Platinum was then deposited and the host structure was selectively removed by dissolving the sacrificial LOR layer to leave behind the isolated platinum lines. @FootnoteText@ @footnote 1@Hatzor A, Weiss P, Science 291,1019. @footnote 2@Subramanian S, Catchmark J, JM3, accepted, 2005.