AVS 52nd International Symposium
    Nanometer-Scale Science and Technology Thursday Sessions

Session NS-ThM
Nanotube-based Devices

Thursday, November 3, 2005, 8:20 am, Room 210
Moderator: S. Evoy, University of Alberta, Canada


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:20am NS-ThM1 Invited Paper
Quantum-dot Nanodevices with Carbon Nanotubes
K. Ishibashi, S. Moriyama, T. Fuse, D. Tsuya, M. Suzuki, RIKEN, Japan
9:00am NS-ThM3
Stable Electron Emission from a Multi-Wall Carbon Nanotube in Low Vacuum
H. Suga, Nihon University, Japan, H. Abe, M. Tanaka, National Institute of Advanced Industrial Science and Technology (AIST), Japan, T. Ohno, Technex Lab Co., Japan, Y. Nishioka, Nihon University, Japan, H. Tokumoto, T. Shimizu, AIST, Japan
9:20am NS-ThM4
Carbon Nanotubes as Ballistic Phonon Waveguides and Electro-Mechanical Switches
V. Deshpande, H.-Y. Chiu, H. Postma, M. Bockrath, California Institute of Technology
9:40am NS-ThM5 Invited Paper
Carbon Nanotube Transistors and How They Are Different
J. Appenzeller, IBM Research Division
10:20am NS-ThM7
Carbon Nanotube Schottky Diodes for High Frequency Applications
E.W. Wong, H.M. Manohara, E. Schlecht, B.D. Hunt, P.H. Siegel, Jet Propulsion Laboratory, California Institute of Technology
10:40am NS-ThM8
Study of High-Field Electron Transport in Multi-Wall Carbon Nanotubes by MCBJ Technique
M. Tsutsui, Y. Taninouchi, S. Kurokawa, A. Sakai, Kyoto University, Japan
11:00am NS-ThM9
Enhancement on Field Emission Performance of MWNTs Impregnated with RuO@sub 2@ and Rooted into Metal Substrate
H. Liu, The Graduate University for Advanced Studies, Japan, T. Noguchi, K. Tatenuma, KAKEN Inc., Japan, S. Kato, The Graduate University for Advanced Studies, Japan
11:20am NS-ThM10
Topologically Induced Localized States in Single Wall Carbon Nanotubes
S.-J. Kahng, Korea University, S. Lee, H. Kim, J. Lee, Y. Kuk, Seoul National University, Korea
11:40am NS-ThM11
Optimization of Impregnation of Subnano RuO@sub 2@ Clusters on MWCNT for Field Emission Displays
T. Noguchi, K. Tatenuma, KAKEN Inc., Japan, S. Kato, High Energy Accelerator Research Organization (KEK), Japan