| AVS 52nd International Symposium | |
| Applied Surface Science | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | AS+TF-ThM1 Characterization of Nanoscale Ceramic Gradient Coatings for Gas Analytical Microdevices M. Bruns, V. Trouillet, H. Mueller, E. Nold, Forschungszentrum Karlsruhe GmbH, Germany, R.G. White, Thermo Electron Corporation, England |
| 8:40am | AS+TF-ThM2 Characterization of Low k Dielectrics Using Auger Microprobe Analysis C. Dziobkowski, IBM Corporation, E. Fishkill, E.D. Adams, IBM Corporation, Essex Jct., J.A. Coffin, R.E. Davis, P.L. Flaitz, IBM Corporation, Hopewell Jct., E.G. Liniger, IBM Research, Yorktown Heights, S.E. Molis, D.D. Restaino, IBM Corporation, Hopewell Jct. |
| 9:00am | AS+TF-ThM3 Invited Paper Semiconductor-Dielectric Interfaces: Composition and Structure L.C. Feldman, S. Dhar, Vanderbilt University, J.R. Williams, Auburn University, L. Porter, Carnegie- Mellon University, J. Bentley, Oak Ridge National Laboratory, K.-C. Chang, Y. Cao, Carnegie-Mellon University |
| 9:40am | AS+TF-ThM5 Comparison of Silicon Oxynitride Produced by PIII/D and Reactive Sputtering N.D. Theodore, M. Bagge-Hansen, B.C. Holloway, D.M. Manos, College of William and Mary, C. Hernandez, T. Siggins, H.F. Dylla, Jefferson Lab |
| 10:00am | AS+TF-ThM6 Microbridge Testing of Plasma Enhanced Chemical Vapor Deposited Silicon Oxide Films on Silicon Wafers Z. Cao, Boston University, T.-Y. Zhang, Hong Kong University of Science and Technology, X. Zhang, Boston University |
| 10:20am | AS+TF-ThM7 Characterization of Ultra Shallow Arsenic Implants by ARXPS, LEXES, MEIS, and Dynamic SIMS G. Conti, Y. Uritsky, H. Graoui, M. Foad, Applied Materials, C.R. Brundle, Brundle & Associates, D. Kouzminov, Materials Analytical Services, C. Hitzman, Full Wafer Analysis, P. Mack, J. Wolstenholme, Thermo Electron Inc., UK |
| 10:40am | AS+TF-ThM8 Hot Electron Transport Across Manganese Silicide Layers on the Si(001) Surface A. Stollenwerk, M.R. Krause, V.P. LaBella, University at Albany SUNY |
| 11:00am | AS+TF-ThM9 Optimization and Deposition of CdS Thin Films As Applicable to TiO@sub2@/CdS Composite Catalysis K. Prabakar, T. Takahashi, Toyama University, Japan, T. Nakashima, Kashiwa Chuo High School, Japan, Y. Kubota, Yokohama City University, Japan, A. Fujishima, Kanagawa Academy of Science and Technology, Japan |