| AVS 51st International Symposium | |
| Thin Films | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| TF-MoP1 Effect of the Deposition Parameters on the Microstructure and Optical Properties of Yttria-stabilized Zirconia Thin Films Deposited by r.f. Reactive Magnetron Sputtering M.H. Shiao, National Science Council, Taiwan, C.W. Peng, Kun Shan University of Technology, Taiwan, C.Y. Su, National Science Council, Taiwan, C.C. Jiang, Ming Hsin University of Science & Technology, Taiwan, S.C. Chang, Kun Shan University of Technology, Taiwan |
| TF-MoP2 (CdTe)@sub 1-x@Al@sub x@ Thin Films Grown by RF Co-sputtering for Photovoltaic Applications@footnote 1@ L.A. Estrada -Domínguez, ESFM-IPN, México, M. Meléndez-Lira, M. Becerril-Silva, Cinvestav-IPN, México, M. Zapata-Torres, CICATA-IPN, México, S.J. Jiménez-Sandoval, Cinvestav-IPN, México |
| TF-MoP3 Tailored Stoichiometries of Silicon Carbonitride Thin Films Prepared by Combined RF Magnetron Sputtering and Ion Beam Synthesis M. Bruns, U. Geckle, V. Trouillet, Forschungszentrum Karlsruhe GmbH, Germany, M. Rudolphi, H. Baumann, Universitaet Frankfurt /Main, Germany |
| TF-MoP4 Combinatorial Synthesis of Rare Earth-doped Yttrium Aluminum Garnet Thin Film Materials by Using rf Reactive Magnetron Sputtering Y. Deng, J.D. Fowlkes, P.D. Rack, University of Tennessee |
| TF-MoP5 Electrical Properties of Ni-Cr Thin Films Deposited by Co-Sputtering Method G.-B. Park, Yuhan College, Korea, P.-K. Shin, B.-J. Lee, Inha University, Korea |
| TF-MoP6 Target Surface Oxide Layer Formed by Reactive Sputtering of Ti Target in Ar+O@sub 2@ Mixed Gas Y. Abe, K. Takamura, M. Kawamura, K. Sasaki, Kitami Institute of Technology, Japan |
| TF-MoP7 Water Absorption and Dielectric Changes in Crystalline Poly(vinylidene fluoride-trifluoroethylene) Copolymer Films L.G. Rosa, P.A. Jacobson, C.M. Othon, K.L. Kraemer, A.V. Sorokin, S. Ducharme, P.A. Dowben, University of Nebraska-Lincoln |
| TF-MoP8 Water-incorporation in Reactively Sputtered Carbon Nitride Coatings B.L. French, Z. Yang, B.C. Holloway, College of William and Mary |
| TF-MoP9 Deposition of Thin Films on Inclined Surfaces Using Ionized PVD M. Lattemann, J. Alami, J. Böhlmark, U. Helmersson, Linköping University, Sweden |
| TF-MoP10 TCO Thin Film Characteristics with Respect to Multi Layer Coatings between Plastic Substrate and ITO Layer M.G. Kim, H.S. Jeong, Y.W. Seo, ITM Inc., Korea, S.J. Kwon, Kyungwon Univ., Korea |
| TF-MoP11 Photoluminescence Behaviors of Eu-doped Sr@sub 2@SiO@sub 4@ Thin Film Phosphors Deposited by Pulsed Laser Deposition S.S. Yi, Silla University, Korea, J.S. Bae, J.H. Jeong, Pukyong National University, Korea, J.H. Kim, Dongeui University, Korea, H. Park, Yonsei University, Korea |
| TF-MoP12 Luminescence Characteristics of Eu-doped GdVO@sub 4@ Thin Films Grown by Pulsed Laser Deposition J.H. Jeong, J.S. Bae, B.K. Moon, H.J. Seo, Pukyong National University, Korea, S.S. Yi, Silla University, Korea |
| TF-MoP13 Preparation of Transparent and Conductive Multicomponent Zn-In-Sn Oxide Thin Films by Vacuum Arc Plasma Evaporation T. Minami, S. Tsukada, Y. Minamino, T. Miyata, Kanazawa Institute of Technology, Japan |
| TF-MoP14 Cathodic Vacuum Arc Deposition of MgO Thin Films on the Large Area Glass Substrate L. Sunghun, B. Sung-Kyu, K. Jong-Kuk, L. Gun-Hwan, Korea Institute of Machinery and Materials, Korea |
| TF-MoP15 Chemical Mechanical Polishing Characteristics of SnO2 Thin Film for Gas Sensor Application Y.J. Seo, DAEBUL University, South Korea, K.W. Choi, W.S. Lee, Chosun University, South Korea |
| TF-MoP16 Defect Study Post the Tungsten Etch Back Process Step A. Sidhwa, J. Zhang, V. Varadarjan, C. Li, B. Le, G. Magsamen, STMicroelectronics, Inc. |
| TF-MoP17 Fabrication of Well-defined Cu Nanodots Based on an Electroless Plating using Diblock Copolymer Nanotemplate S. Asakura, Waseda University, Japan, A. Hozumi, National Institute of Advanced Industrial Science and Technology, Japan, K. Oda, A. Fuwa, Waseda University, Japan |
| TF-MoP19 Observation of Plastic Deformation in TIALCN/A-C Ceramic Nanocomposite Coating J. Shieh, National Nano Device Laboratory, Taiwan, M.-H. Hon, National Cheng Kung University, Taiwan |
| TF-MoP20 Strained Si n-channel Metal-oxide-semiconductor Transistor on Relaxed SiGe Film with an Intermediate Si:C Layer S.-W. Lee, National Tsing Hua University, Taiwan, P.S. Chen, Industrial Technology Research Institute, Taiwan, Y.L. Chieh, National Tsing Hua University, Taiwan, M.-J. Tsai, C.W. Liu, Industrial Technology Research Institute, Taiwan, L.J. Chen, National Tsing Hua University, Taiwan |
| TF-MoP21 Gas Barrier Properties of the Composite Films Consisting of SiO2 and SnO2 W.H. Koo, S.M. Jeong, S.H. Choi, H.K. Baik, Yonsei University, Korea, S.M. Lee, Kangwon National University, Korea, S.J. Lee, Kyungsung University, Korea |
| TF-MoP22 Ultra High Resolution Tomographic Reconstruction Using Scanning Electron Microscope and Focused Ion Beam R.K. Bansal, R.V. Hull, J.M. Fitz-Gerald, University of Virginia |
| TF-MoP23 Deposition of Ti(C,N) AND Zr(C,N) Thin Films by Plasma Assisted MOCVD and In-Situ Plasma Diagnostics with Optical Emission Spectroscopy J.-H. Boo, S.W. Lee, Y.K. Cho, J.G. Han, Sungkyunkwan University, South Korea |
| TF-MoP24 In-situ Characterization of HfO@sub 2@ and AlN Films on SiC C.M. Tanner, J. Choi, J.P. Chang, University of California, Los Angeles |
| TF-MoP25 Conduction Anisotropy in Nanostructured Titanium Films D.W. Vick, M.J. Brett, University of Alberta, Canada |
| TF-MoP26 Monolayer Template Patterning of Ceramic Film on Flexible Plastic Substrate N. Shirahata, Y. Sakka, National Institute of Materials Science, Japan, A. Hozumi, National Institute of Advanced Industrial Science and Technology, Japan |
| TF-MoP27 Comparison of the Agglomeration Behavior of Thin Metallic Films on SiO@sub 2@ P.R. Gadkari, A.P. Warren, R.M. Todi, T. Cubano-Cruz, K.R. Coffey, University of Central Florida |
| TF-MoP28 Effect of a Buffer Layer on the Photovoltaic Properties of AZO/Cu@sub 2@O Solar Cells T. Minami, Kanazawa Institute of Technology, Japan, H. Tanaka, Gunze Limited, Japan, T. Shimakawa, T. Miyata, Kanazawa Institute of Technology, Japan, H. Sato, Gunze Limited, Japan |
| TF-MoP29 Microstructural Evolution and Properties of the AlN Thin Films prepared under Different Processing Parameters C.-C. Wang, National Chung Hsing University, Taiwan, M.H. Shiao, National Science Council, Taiwan, C.-J. Lu, F.S. Shieu, National Chung Hsing University, Taiwan |
| TF-MoP30 AFM and SNOM Characterization of Carboxylic Acid Terminated Silicon and Silicon Nitride Surfaces A. Cricenti, National Research Council, Italy, R. Generosi, M. Girasole, CNR, Italy, G. Margaritondo, EPFL, Switzerland, P. Thielen, Naval Research Laboratory, D. Vobornik, EPFL, Switzerland, J.S. Sanghera, I.D. Aggarwal, Naval Research Laboratory, N.H. Tolk, D.W. Piston, Vanderbilt University, A. Flamini, T. Prosperi, F. Cattaruzza, A. Mezzi, P. Perfetti, G. Ustione, A. Ustione, CNR, Italy |
| TF-MoP31 Relationship of Microstructure and Discharge Characteristics of MgO Protecting Layer of AC-PDPs S.Y. Park, M.J. Lee, S.H. Moon, S.G. Kim, H.J. Kim, Seoul National University, South Korea |
| TF-MoP32 Thin Film Deposition of SiO@sub 2@ Using Electron-Beam Generated Plasmas D. Leonhardt, S.G. Walton, Naval Research Laboratory, C. Muratore, ASEE/NRL Research Fellow, R.A. Meger, Naval Research Laboratory |