AVS 51st International Symposium
    Thin Films Monday Sessions
       Session TF-MoP

Paper TF-MoP31
Relationship of Microstructure and Discharge Characteristics of MgO Protecting Layer of AC-PDPs

Monday, November 15, 2004, 5:00 pm, Room Exhibit Hall B

Session: Poster Session
Presenter: S.Y. Park, Seoul National University, South Korea
Authors: S.Y. Park, Seoul National University, South Korea
M.J. Lee, Seoul National University, South Korea
S.H. Moon, Seoul National University, South Korea
S.G. Kim, Seoul National University, South Korea
H.J. Kim, Seoul National University, South Korea
Correspondent: Click to Email
MgO thin film is widely used as a protecting layer of the dielectric layer for alternating current plasma display panels(AC-PDPs) due to improvement of the panelâ?Ts discharge characteristics and lifetime. The discharge characteristics of AC-PDPs are critically dependent on the microstructure of MgO films; crystalline, surface morphology, and so on. We had focused on the relationship between microstructure of MgO protecting layer and discharge characteristics of AC-PDPs. MgO thin film was deposited with different E-beam evaporation source type; single crystal, melting, sintering, and powder. MgO thin film deposited with melting source had the highest density and peak intensity of (100) preferred orientation, but the film deposited with powder source had the lowest density, bimodal grain size distribution and oriented to (111) plane direction. It was due to the mobility of the adatom on the surface of growing MgO film. The variation of MgO source type led to change the various microstructures of MgO thin films in the same deposition condition, finally, it affected the discharge characteristics.