AVS 51st International Symposium
    Plasma Science and Technology Wednesday Sessions

Session PS-WeA
Plasma Diagnostics

Wednesday, November 17, 2004, 2:00 pm, Room 213A
Moderator: W.M.M. Kessels, Eindhoven University of Technology, The Netherlands


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Click a paper to see the details. Presenters are shown in bold type.

2:00pm PS-WeA1
Excitation Mechanisms in Low Pressure Capacitively Coupled Discharges
G.F. Franz, University of Applied Sciences, Germany, M.K. Klick, Advanced Semiconductor Instruments, Germany
2:20pm PS-WeA2
Influence of Frequency on the Characteristics of UHF Capacitively Coupled Plasmas in a 300 mm Chamber
G.A. Hebner, E.V. Barnat, P.A. Miller, Sandia National Laboratories, A.M. Paterson, J.P. Holland, T. Lill, Applied Materials, Inc.
2:40pm PS-WeA3
Monitoring Electron Density of Processing Plasmas Using a Transmission-line Type Microwave Sensor
C.H. Hseih, K.C. Leou, C. Lin, National Tsing Hua University, Taiwan
3:00pm PS-WeA4
Real-time Monitoring of Charge Accumulated during SiO@sub 2@ Etching using Pulse-Time-Modulated-Plasma
Y. Suzuki, T. Shimmura, S. Samukawa, Tohoku University, Japan
3:20pm PS-WeA5
The Use of the Radio Frequency Matching Network As a Diagnostic for Plasma Processing Chambers
J. Caughman, G.L. Bell, Oak Ridge National Laboratory, V. Resta, Hewlett-Packard
3:40pm PS-WeA6
Measurements and Consequences of Non-Uniform RF Plasma Potential due to Surface Asymmetry in Large Area RF Capacitive Reactors
L. Sansonnens, L. Derendinger, C. Hollenstein, A.A. Howling, H. Schmidt, Ecole Polytechnique Fédérale de Lausanne, Switzerland, J.P.M. Schmitt, E. Sakanaka, UNAXIS-France SA, France
4:00pm PS-WeA7
Radiofrequency Discharge and Sheath Structure Around Dissimilar Surfaces
E.V. Barnat, G.A. Hebner, Sandia National Laboratories
4:20pm PS-WeA8
Real-time, Nonintrusive Monitoring of Drifting Ion Energy and Flux in a High-Density, Inductively Coupled Plasma Reactor
M.A. Sobolewski, National Institute of Standards and Technology
4:40pm PS-WeA9
Investigation of Correlation between Etching Profiles and Neutral Density in Cl@sub 2@/O@SUB 2@ Plasmas
M. Mori, Hitachi Ltd., Japan, G. Cunge, M. Kogelschatz, CNRS/LSP, France, L. Vallier, CNRS/LTM, France
5:00pm PS-WeA10
2D-Imaging Measurements of Sputtered Atom Velocities in dc Magnetron Discharges by Doppler-Shifted LIF
K. Sasaki, Nagoya University, Japan, K. Shibagaki, Suzuka National College of Technology, Japan, N. Nafarizal, H. Toyoda, T. Kato, S. Iwata, S. Tsunashima, H. Sugai, Nagoya University, Japan