AVS 51st International Symposium | |
Plasma Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
2:00pm | PS-WeA1 Excitation Mechanisms in Low Pressure Capacitively Coupled Discharges G.F. Franz, University of Applied Sciences, Germany, M.K. Klick, Advanced Semiconductor Instruments, Germany |
2:20pm | PS-WeA2 Influence of Frequency on the Characteristics of UHF Capacitively Coupled Plasmas in a 300 mm Chamber G.A. Hebner, E.V. Barnat, P.A. Miller, Sandia National Laboratories, A.M. Paterson, J.P. Holland, T. Lill, Applied Materials, Inc. |
2:40pm | PS-WeA3 Monitoring Electron Density of Processing Plasmas Using a Transmission-line Type Microwave Sensor C.H. Hseih, K.C. Leou, C. Lin, National Tsing Hua University, Taiwan |
3:00pm | PS-WeA4 Real-time Monitoring of Charge Accumulated during SiO@sub 2@ Etching using Pulse-Time-Modulated-Plasma Y. Suzuki, T. Shimmura, S. Samukawa, Tohoku University, Japan |
3:20pm | PS-WeA5 The Use of the Radio Frequency Matching Network As a Diagnostic for Plasma Processing Chambers J. Caughman, G.L. Bell, Oak Ridge National Laboratory, V. Resta, Hewlett-Packard |
3:40pm | PS-WeA6 Measurements and Consequences of Non-Uniform RF Plasma Potential due to Surface Asymmetry in Large Area RF Capacitive Reactors L. Sansonnens, L. Derendinger, C. Hollenstein, A.A. Howling, H. Schmidt, Ecole Polytechnique Fédérale de Lausanne, Switzerland, J.P.M. Schmitt, E. Sakanaka, UNAXIS-France SA, France |
4:00pm | PS-WeA7 Radiofrequency Discharge and Sheath Structure Around Dissimilar Surfaces E.V. Barnat, G.A. Hebner, Sandia National Laboratories |
4:20pm | PS-WeA8 Real-time, Nonintrusive Monitoring of Drifting Ion Energy and Flux in a High-Density, Inductively Coupled Plasma Reactor M.A. Sobolewski, National Institute of Standards and Technology |
4:40pm | PS-WeA9 Investigation of Correlation between Etching Profiles and Neutral Density in Cl@sub 2@/O@SUB 2@ Plasmas M. Mori, Hitachi Ltd., Japan, G. Cunge, M. Kogelschatz, CNRS/LSP, France, L. Vallier, CNRS/LTM, France |
5:00pm | PS-WeA10 2D-Imaging Measurements of Sputtered Atom Velocities in dc Magnetron Discharges by Doppler-Shifted LIF K. Sasaki, Nagoya University, Japan, K. Shibagaki, Suzuka National College of Technology, Japan, N. Nafarizal, H. Toyoda, T. Kato, S. Iwata, S. Tsunashima, H. Sugai, Nagoya University, Japan |