| AVS 51st International Symposium | |
| Plasma Science and Technology | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| PS-TuP1 CVD Chamber Cleaning by F2 Remote Plasma Processing S.C. Kang, J.Y. Hwang, N.-E. Lee, Sungkyunkwan University, South Korea, K.S. Joo, G.H. Bae, Shihwa Indus. Com, South Korea |
| PS-TuP2 Design and Development of an Advanced Dielectric Etch Tool using Simulation K. Bera, Y. Ye, D. Hoffman, G.A. Delgadino, J. Carducci, Applied Materials, Inc. |
| PS-TuP3 Spectroscopic Study of Effect of Wall Conditions on Gas Phase and Surface Phase Chemistries in Inductively Coupled Fluorocarbon Plasmas B.S. Zhou, E.A. Joseph, S.P. Sant, L.J. Overzet, M.J. Goeckner, University of Texas at Dallas |
| PS-TuP4 Stabilizing Plasma and RF Generator Interactions V. Brouk, R. Heckman, Advanced Energy Industries, Inc. |
| PS-TuP5 Effect of Magnetic Field on the Characteristics of Internal Linear-type Inductively Coupled Plasma Source G.Y. Yeom, K.N. Kim, S.J. Jeong, Sungkyunkwan University, South Korea |
| PS-TuP6 Mass and Optical Spectroscopic Studies of an Inductively Coupled Oxygen Plasma P.F. Kurunczi, V.M. Donnelly, University of Houston |
| PS-TuP7 Sub Millimeter Absorption Spectroscopy of Oxygen Containing Fluorocarbon Etching Plasmas E.C. Benck, K. Siegrist, NIST |
| PS-TuP8 In Situ Diagnostics in a High Density Inductively Coupled Methane Discharge T. Meziani, P. Colpo, Joint Research Centre of the European Commission, Italy, P.R. Ranson, GREMI - Orleans University, France, F. Rossi, Joint Research Centre of the European Commission, Italy |
| PS-TuP9 Electron Probe Currents in ICPs F.F. Chen, UCLA |
| PS-TuP10 Spatio-temporal Characterization of Pulsed, Electron Beam Generated Plasmas for Materials Processing S.G. Walton, D. Leonhardt, Naval Research Laboratory, C. Muratore, ASEE Postdoctoral Fellow, R.F. Fernsler, Naval Research Laboratory |
| PS-TuP11 Study on Relation Between CF2 Radicals and Plasma Parameters in ICP Plasmas with Laser-Induced Fluorescence and Wave Cutoff Probe J.-H. Kim, Y.-S. Yoo, Y.-H. Shin, K. Chung, Korea Research Institute of Standards and Science, Korea |
| PS-TuP12 Simulation Study of Plasma Display Panel Micro Discharge at Atmospheric Pressure Regime S. Mukherjee, J.K. Lee, Pohang University of Science and Technology, South Korea |
| PS-TuP13 Effects of a Pulse Duty Ratio in Dual Frequency Capacitively Coupled Plasma and a Magnetic Field by a Three-Dimensional Charge-Up Simulation S.J. Kim, S.J. Wang, Pohang University of Science and Technology, South Korea, H.J. Lee, Pusan National University, South Korea, J.K. Lee, Pohang University of Science and Technology, South Korea |
| PS-TuP14 Time and Space Resolved Optical Emission Spectrogram of Inductively Coupled Chlorine Plasmas for Etch Process P.H. Huang, T.L. Lin, K.C. Leou, H.J. Ding, C. Lin, National Tsing Hua University, Taiwan |
| PS-TuP15 Controlling of UV Radiation Damages using On-wafer Monitoring Technique M. Okigawa, Y. Ishikawa, Y. Katoh, S. Samukawa, Tohoku University, Japan |
| PS-TuP16 Diagnostic Studies on a H@sub 2@-N@sub 2@ Inductively Coupled Plasma for Plasma-Assisted Atomic Layer Deposition S.B.S. Heil, E. Langereis, R. Engeln, M.C.M. van de Sanden, W.M.M. Kessels, Eindhoven University of Technology, The Netherlands |
| PS-TuP17 Estimation of the Surface Potential Generated on Semiconductor Dielectric Materials Upon Exposure to Vacuum Ultraviolet Radiation Using a Monte-Carlo Simulation@footnote 1@ G.S. Upadhyaya, J.L. Shohet, J.L. Lauer, University of Wisconsin-Madison |
| PS-TuP18 Induced Charge during Vacuum-Ultraviolet Irradiation of Al@sub 2@O@sub 3@, SiO@sub 2@, and Si@sub 3@N@sub 4@@footnote 1@ J.L. Shohet, J.L. Lauer, R.W. Hansen, G.S. Upadhyaya, R.D. Bathke, K. Kukkady, J.M. Kalwitz, University of Wisconsin-Madison |
| PS-TuP19 Electrical Characteristics of Linear Internal-type Inductively Coupled Plasmas Source G.Y. Yeom, K.N. Kim, S.J. Jeong, Sungkyunkwan University, South Korea |
| PS-TuP20 Effects of Water Vapor on Plasma Parameters in Processing Plasmas Y. Ichikawa, M. Narita, K. Sasaki, Fuji Electric Device Technology Co., Ltd., Japan |
| PS-TuP21 Evaluation of Germicidal Effect by Plasma Sterilization System in Air J.H. Choi, H.K. Baik, J.C. Park, D.W. Han, Yonsei University, Korea |
| PS-TuP22 Extending the "Winters and Coburn Method"@super 1@ to Plasma Propellant Interactions R. Valliere, R. Blumenthal, Auburn University |
| PS-TuP25 The Fate of Nitrogen in Plasma Polymerization Revealed by NEXAFS A.G. Shard, S.L. McArthur, University of Sheffield, UK, J.D. Whittle, Plasso Technology, UK, A.J. Beck, R.A. Talib, N.A. Bullett, P.N. Brookes, University of Sheffield, UK |