AVS 51st International Symposium
    Plasma Science and Technology Tuesday Sessions
       Session PS-TuP

Paper PS-TuP5
Effect of Magnetic Field on the Characteristics of Internal Linear-type Inductively Coupled Plasma Source

Tuesday, November 16, 2004, 4:00 pm, Room Exhibit Hall B

Session: Poster Session
Presenter: G.Y. Yeom, Sungkyunkwan University, South Korea
Authors: G.Y. Yeom, Sungkyunkwan University, South Korea
K.N. Kim, Sungkyunkwan University, South Korea
S.J. Jeong, Sungkyunkwan University, South Korea
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Due to the increase of substrate size and the requirement of high rate processing, large-area high density plasma sources are required for both microelectronics and flat panel display industry. Among the various high density plasma sources, inductively coupled plasma sources are preferred due to its simple physics and scalability. However, conventional spiral-type external inductively coupled plasma source can not be easily applied to the flat panel display processing due to the standing wave effect, increased capacitive coupling, etc. In our study, a large area (1020mm x 830mm) internal linear inductively plasma source was investigated as a possible high density plasma source for the application to flat panel display processing. Especially, in this presentation, the effect of permanent magnet array on the large area (1020mm x 830mm) linear internal inductively coupled plasma source will be discussed. By the various arrangements of the permanent magnet arrays relative to the inductive source, the uniformity of the plasma has changed significantly, and, by optimizing the magnet arrangement, the plasma uniformity of 2% could be obtained on the substrate. Also, with the optimized magnet arrangement, the photoresist etch rates showed about 60% higher etch rates compared to those without the magnetic field in 15mTorr O@sub2@ gas.