| AVS 51st International Symposium | |
| Nanometer-scale Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | NS-WeM1 Invited Paper Massive Self-Assembly for Integrated Carbon Nanotube Circuits S. Hong, Seoul National University, Korea |
| 9:00am | NS-WeM3 Surface-Programmed Assembly of Carbon Nanotubes on Silicon Oxide Surfaces for Integrated Circuit Applications M. Lee, J. Im, S. Hong, Seoul National University, South Korea |
| 9:20am | NS-WeM4 Recent Lithography Results from the Digital E-Beam Array Lithography (DEAL) Concept W.L. Gardner, L.R. Baylor, Oak Ridge National Laboratory, X. Yang, University of Tennessee, Knoxville, R.J. Kasica, D.K. Hensley, Oak Ridge National Laboratory, A.V. Melechko, Univeristy of Tennessee, Knoxville, D.C. Joy, P.D. Rack, B. Blalock, S. Islam, University of Tennessee, Knoxville, M.A. Guillorn, Cornell Nanofabrication Facility, M.L. Simpson, Oak Ridge National Laboratory |
| 9:40am | NS-WeM5 Monomer Based Thermally Curable Imprinting Lithography H. Lee, Korea University, Korea |
| 10:00am | NS-WeM6 Charge Interactions in Ferroelectric Substrates: the Basis of Ferroelectric Nanolithography D.B. Li, R. Shao, D.A. Bonnell, The University of Pennsylvania |
| 10:20am | NS-WeM7 Invited Paper Nanoscale Patterning in Application to Novel Materials and Device Structures N. Zhitenev, Bell Labs, Lucent Technologies |
| 11:00am | NS-WeM9 Fabrication of Nanopatterned Polymer Brushes by Scanning-Probe and Electron-Beam Lithography W.K. Lee, M. Kaholek, S.J. Ahn, S. Zauscher, Duke University |
| 11:20am | NS-WeM10 Thermal Control in Dip Pen Nanolithography P.E. Sheehan, Naval Research Laboratory, W.P. King, Georgia Tech, L.J. Whitman, Naval Research Laboratory |
| 11:40am | NS-WeM11 Chemomechanically Scribing Silicon with an AFM in a Read/Write Fashion M.V. Lee, K. Gertsch, R.C. Davis, M.R. Linford, Brigham Young University |