Nanoimprint lithography is one of the most viable technologies for mass production of devices with nano-patterns such as optical components (polarizer and diffuser), bio and NEMS devices, photonic crystals and patterned magnetic media. With this technology, nano patterns are generated by duplicating the ruggedness of imprinting stamp onto polymer films on the substrate. However, high pressure ( >800psi) and high temperature ( >150C)operation is required to transfer nano patterns onto polymer film. In this study, a mixture of base monomer, vaporization inhibitor, anti-sticking agent and thermal initiator was used as an imprint resin. Viscosity of mixture was controlled by relative amount of vaporization inhibitor. Compared to the polymer based resin such as PMMA, monomer based resin has several advantages. Since the monomer based imprinting resin is in liquid phase without heating up to the decomposition temperature of thermal initiator, high quality pattern transfer with minimized residual layer can be done at much lower imprinting pressure. The decomposition temperature of thermal initiator is relatively lower than the glass temperature of polymer. Thus, imprinting can be done at lower temperature (below 100C). Thus, time consumption for heating and cooling can be reduced and higher throughput was obtained. In this study, whole 6 inch diameter wafers were patterned by single step imprinting with the same sized stamp.