| AVS 50th International Symposium | |
| Plasma Science and Technology | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS-MoA1 Ion-Acoustic Solitons in a High Power Pulsed Magnetron Sputtering Discharge K.B. Gylfason, University of Iceland, J. Alami, U. Helmersson, Linkoping University, Sweden, J.T. Gudmundsson, University of Iceland |
| 2:20pm | PS-MoA2 Next Generation RF Ion Beam Source for Three-Dimensional and other Critical Etching Applications A.V. Hayes, V. Kanarov, R. Yevtukhov, C. Borges, K. Williams, M. Campo, B. Druz, Veeco Instruments, Inc. |
| 2:40pm | PS-MoA3 The Use of Reactive Gases with Broad-beam RF Ion Sources for Industrial Applications St. Schneider, Forschungszentrum Juelich, Germany, T.W. Jolly, Oxford Instruments Plasma Technology Ltd., H. Kohlstedt, R. Waser, Forschungszentrum Juelich, Germany |
| 3:00pm | PS-MoA4 Reactive Sputter Deposition of Nanocrystalline Compound Thin Films with a Hollow Cathode Source Operated in a Static Mode A. Pradhan, S.I. Shah, University of Delaware |
| 3:20pm | PS-MoA5 Invited Paper Evolution of Radiofrequency Plasma Sources F.F. Chen, University of California, Los Angeles |
| 4:00pm | PS-MoA7 Physics of High-pressure Helium and Argon Plasmas M. Moravej, S.E. Babayan, X. Yang, G.R. Nowling, R.F. Hicks, University of California, Los Angeles |
| 4:20pm | PS-MoA8 Two-dimensional Self-consistent Modeling of Wave Propagation and Plasma Dynamics in a Helicon Source D. Bose, Eloret Corp., T.R. Govindan, M. Meyyappan, NASA Ames Research Center |
| 4:40pm | PS-MoA9 Large Area Electron-Beam Generated Plasma Processing System@footnote 1@ D. Leonhardt, C. Muratore, S.G. Walton, Naval Research Laboratory, D.D. Blackwell, SFA Inc., R.F. Fernsler, R.A. Meger, Naval Research Laboratory |
| 5:00pm | PS-MoA10 Post-etch Wafer Cleaning by a New Dry-cleaning Technique using Both Gas Flow and Plasma Y. Momonoi, K. Yokogawa, M. Izawa, Hitachi Ltd., Japan |