| AVS 50th International Symposium | |
| Processing at the Nanoscale | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | NS+MI-TuA1 Invited Paper Patterning Magnetic Recording Media by Imprinting G.M. McClelland, M.W. Hart, IBM Almaden Research Center, M.E. Best, Hitachi San Jose Research Center, C.T. Rettner, K.R. Carter, IBM Almaden Research Center, G. Hu, B.D. Terris, M. Albrecht, Hitachi San Jose Research Center |
| 2:40pm | NS+MI-TuA3 Buffer Layer Assisted Laser Patterning of Metals at the Nanometer Scale G. Kerner, M. Asscher, The Hebrew University of Jerusalem, Israel |
| 3:00pm | NS+MI-TuA4 Low-Temperature Nanolithography using Energetic Neutral Atoms E.A. Akhadov, A.H. Mueller, M.A. Hoffbauer, Los Alamos National Laboratory |
| 3:20pm | NS+MI-TuA5 Invited Paper Self-Assembling Circuits? K.W. Guarini, C.T. Black, IBM |
| 4:00pm | NS+MI-TuA7 Fabrication and Electrical Characterization of 2D Dopant Nanostructures in Si J.S. Kline, J.C. Kim, S.J. Robinson, K.-F. Chen, R. Chan, M. Feng, J.R. Tucker, University of Illinois at Urbana-Champaign, J.-Y. Ji, T.-C. Shen, Utah State University, C. Yang, R.-R. Du, University of Utah |
| 4:20pm | NS+MI-TuA8 Polymer Patterning using a Soft Inkpad Y.P. Kong, Institute of Materials Research and Engineering, Singapore, L. Tan, L.-R. Bao, University of Michigan, Ann Arbor, X.D. Huang, Institute of Materials Research and Engineering, Singapore, S.W. Pang, University of Michigan, Ann Arbor, A.F. Yee, Institute of Materials Research and Engineering, Singapore |
| 4:40pm | NS+MI-TuA9 Influence of Stoichiometry and Structure on the Local Oxidation of Metal Films N. Farkas, G. Zhang, K.M. Donnelly, E.A. Evans, R.D. Ramsier, The University of Akron, J.A. Dagata, National Institute of Standards and Technology |