AVS 50th International Symposium | |
Processing at the Nanoscale | Tuesday Sessions |
Session NS+MI-TuA |
Session: | Nanoscale Patterning and Lithography |
Presenter: | G.M. McClelland, IBM Almaden Research Center |
Authors: | G.M. McClelland, IBM Almaden Research Center M.W. Hart, IBM Almaden Research Center M.E. Best, Hitachi San Jose Research Center C.T. Rettner, IBM Almaden Research Center K.R. Carter, IBM Almaden Research Center G. Hu, Hitachi San Jose Research Center B.D. Terris, Hitachi San Jose Research Center M. Albrecht, Hitachi San Jose Research Center |
Correspondent: | Click to Email |