| AVS 50th International Symposium | |
| Manufacturing Science and Technology | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| MS-TuP1 Perfluoroelastomer Sealing Performance in Plasma Environments S. Wang, J.M. Legare, DuPont Dow Elastomers, L.L.C. |
| MS-TuP2 A Novel Power Supply with Arc Handling for High Peak Power Magnetron Sputtering D.J. Christie, F. Tomasel, W.D. Sproul, D.C. Carter, Advanced Energy Industries, Inc. |
| MS-TuP3 GaAs Recycling using Supercritical Fluid SCFCO@sub2@ with O@sub2@ and H@sub2@O T. Momose, O. Otomo, Miyagi National College of Technology, Japan |
| MS-TuP4 Progress toward Spatially Programmable CVD J. Choo, L. Henn-Lecordier, Y. Liu, R.A. Adomaitis, G.W. Rubloff, University of Maryland |
| MS-TuP6 Effects of Oxidant on Polishing Selectivity in the Chemical Mechanical Planarization of W/Ti/TiN Layer K.J. Lee, Y.-J. Seo, DAEBUL University, Korea, S.Y. Kim, ANAM Semicondctor Co., Inc., Korea, W.S. Lee, Chosun University, Korea |
| MS-TuP7 Slurry Characteristics by Surfactant Condition at Copper CMP Process I.P. Kim, N.H. Kim, Chung-Ang University, Korea, J.H. Lim, Growell Telecom, S.Y. Kim, Dongbu-Anam Semiconductor, Korea, E.G. Chang, Chung-Ang University, Korea |
| MS-TuP8 A Study on Recycle of Abrasive Particles in One-used Chemical Mechanical Polishing (CMP) Slurry S.W. Park, Y.-J. Seo, DAEBUL University, Korea, S.Y. Kim, ANAM Semiconductor Co., Inc., Korea |
| MS-TuP9 Corrosion Characteristics of Diffusion Barrier Ta in Copper CMP D.W. Lee, N.H. Kim, Chung-Ang University, Korea, J.H. Lim, Growell Telecom, S.Y. Kim, Dongbu-Anam Semiconductor, E.G. Chang, Chung-Ang University, Korea |
| MS-TuP10 Measurement of Energy Flux at the Substrate in a Magnetron Sputter System Using an Integrated Sensor S.D. Ekpe, S.K. Dew, University of Alberta, Canada |
| MS-TuP11 Temperature Sensor for Multi-layered Substrate using Optical Fiber type Low-coherence Interferometry K. Takeda, T. Shiina, M. Ito, Y. Okamura, Wakayama University, Japan, N. Ishii, Tokyo Electron Ltd., Japan |
| MS-TuP13 Calibration Standards for X-ray Metrology Systems using a Traceable High-resolution Diffractometer D. Windover, J. Cline, National Institute of Standards and Technology |