AVS 50th International Symposium | |
Applied Surface Science | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:20am | AS-MoM1 Aqueous-derived Planar Proxies: A Connection between Surface Science and Real World Catalysts C.F. Conrad, Virginia Institute of Marine Science, C.J. Chisholm-Brause, M.J. Kelley, College of William & Mary |
8:40am | AS-MoM2 Invited Paper The Role of XPS in Materials Characterization in an Industrial R&D Setting M.C. Burrell, GE Global Research |
9:20am | AS-MoM4 Quantitative Depth Distribution Analysis of Hg and Na in Glass T.A. Dang, T.A. Frisk, M.W. Grossman, C.H. Peters, Osram Sylvania |
9:40am | AS-MoM5 Rutherford Backscattering Quantification of Mercury Interaction with Fluorescent Lamp Materials C.H. Peters, M.W. Grossman, T.A. Dang, T.A. Frisk, Osram Sylvania Inc. |
10:00am | AS-MoM6 Investigation of the Tribological System of Roller Bearings with TOF-SIMS U. Gunst, D. Lipinsky, Westfälische Wilhelms-Universität Münster, Germany, W.-R. Zabel, G. Poll, Universität Hannover, Germany, H.F. Arlinghaus, Westfälische Wilhelms-Universität Münster, Germany |
10:20am | AS-MoM7 Interfacial Analysis between Amorphous Carbon Films and Glass by XPS and Improvement of Adhesion Strength at the Interface by Plasma Treatment S. Takeda, S. Suzuki, Asahi Glass Co., Ltd, Japan |
10:40am | AS-MoM8 Determination of SiGe Film Composition and Thickness by Combined AES and Multiple-Voltage X-ray Emission Analysis J.T. Armstrong, S.A. Wight, R.B. Marinenko, D.S. Simons, E.B. Steel, National Institute of Standards and Technology |
11:00am | AS-MoM9 Carbon Gold Sulfide by 13.56 MHz Plasma CVD and Sputtering Process M.A. Kashem, S. Morita, Nagoya University, Japan |
11:20am | AS-MoM10 Thickness, Dose and Distribution Measurements of Silicon Oxynitride Ultra-thin Films R.K. Champaneria, P. Mack, R.G. White, J. Wolstenholme, Thermo Electron, UK |