AVS 50th International Symposium
    Applied Surface Science Monday Sessions
       Session AS-MoM

Paper AS-MoM9
Carbon Gold Sulfide by 13.56 MHz Plasma CVD and Sputtering Process

Monday, November 3, 2003, 11:00 am, Room 324/325

Session: Practical Surface Science
Presenter: M.A. Kashem, Nagoya University, Japan
Authors: M.A. Kashem, Nagoya University, Japan
S. Morita, Nagoya University, Japan
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Co-operation process of plasma CVD and sputtering is a well-known technique to fabricate metal containing carbonaceous film, however the metal was mixed in the film with polycrystalline structure at content more than a few atomic %.@footnote 1@ CH@sub 4@ and SF@sub 6@ mixture gas plasma induced a unique reaction of HF dissociation and carbon sulfide could be synthesized.@footnote 2@ A new carbon gold sulfide film was formed with using CH@sub 4@, SF@sub 6@ and Ar mixture gas plasma CVD and gold plate discharge electrode. The process was observed and discussed with using a mass spectroscopy. The gold atom was observed to distribute uniformly caused on chemical bond with carbon and sulfur. The carbon gold sulfide structure was confirmed by x-ray diffraction, XPS analysis and refractive index measurement on the effect of thermal treatment at 200 °C. The chemically bonded carbon gold sulfide suggested to be conductive. Therefore, the density of carbon gold sulfide molecular group was observed to affect on a dielectric and conductive property. @FootnoteText@@footnote 1@L. Marutinu, Solar Energy Materials 15, p.21 (1987). @footnote 2@M. Matsushita, Md. Zarid. Bin Harum, Md. Abul Kashem and S. Morita; J. Photoplolym. Sci. and Tech., 12 (1) (1999) pp.11-14.